Canon Kabushiki Kaisha

Yoshihisa Sano

Hideaki Mitsutake

Naoto Nakamura

Shinichi Kawate

Hidetoshi Suzuki

Ichiro Nomura

An electron beam apparatus includes an electron source having an electron-emitting device, an electrode for controlling an electron beam emitted from the electron source, a target to be irradiated with an electron beam emitted from the electron source and a spacer arranged between the electron source and the electrode. The spacer has a semiconductor film on the surface thereof that is electrically connected to the electron source and the electrode.

Electron beam apparatus and image forming apparatus

An electron source comprises a substrate, a row wire and a column wire disposed on the substrate, and an electron-emitting element connected to both the row and column wires. The electron-emitting region of the electron-emitting element is surrounded by one of both the row and column wires.

Electron source and image-forming apparatus with a matrix array of

An electron source or electron beam apparatus comprises an electron-emitting device and a shield member disposed above the electron-emitting device. The electron-emitting device generates an electric field component, when energized, that is parallel to a substrate surface on which the electron-emitting device is disposed, while the shield member has an aperture which allows electrons emitted from the electron-emitting device to pass therethrough, but blocks off charged particles flying toward the electron emitting device.

Growing community of inventors

Atsugi, Japan

Yoshihisa Sano