Dai Nippon Toryo Co., Ltd.

Hitachi Chemical Company, Ltd.

Tokai Kogyo Company Limited

Yoshihisa Nagashima

Toshiya Takahashi

Hajime Kakumaru

Yoshitaka Minami

Toshihiko Akahori

Tsunehiko Toyoda

Takao Sakakibara

Toshihiko Shiotani

Masahiko Hiro

Takuro Kato

Yuhji Yamazaki

Sigeo Tachiki

Norio Uriya

A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.

Negative type photosensitive electrodepositing resin composition

A coating composition having photopolymerizability and heat curability, which comprises, as main components,

Coating composition and process for producing a precoated plate

A molding process for producing a molded plastic product with a resin coating layer formed on its surface, which comprises electrostatically coating a powdery resin composition on the inner surface of a mold, filling and molding a plastic material in the mold to form a molded plastic product, and plasticizing, under compression, said powdery resin composition by the heat of the filled plastic material and/or by the heat for molding the filled plastic material, to form a resin coating layer securely bonded to the surface of the molded plastic product by anchor effect.

Molding process for plastics

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Tochigi, Japan

Yoshihisa Nagashima