Hitachi, Ltd.

Yoshihisa Minamikawa

Yoshio Sakitani

Shinichi Kato

Morioki Kubozoe

Kazumitsu Nakamura

Katsuhiro Kawasaki

Shinjiro Katagiri

Yoshimasa Shimura

Hideyuki Kakiuchi

An electron beam measuring apparatus for measuring size of pattern on surface of a specimen comprising, an electron gun, an electron lens for focusing the electron beam from the electron gun on the specimen surface, a deflector for deflecting the electron beam, a spot control means for forming a flat edge portion in the electron beam spot, a rotation coil for rotating the electron beam so that the flat portion of the electron beam spot becomes to be perpendicular to the scanning direction of the electron beam, a detecting means for detecting secondary electrons reflected from the specimen surface, and a computer for calculating the size of the pattern based on the secondary electrons from the detecting means. As the flat portion of the electron beam spot is perpendicular to the scanning direction, the size of pattern is measured with high accuracy.

Electron beam measuring apparatus

A charged particle beam apparatus in which a beam of charged particles emitted from a beam source is focussed on a target in a predetermined size and shape through a plurality of aperture members. Each of the aperture members is combined with a respective deflecting unit which effects a two-dimensional scan with the charged particle beam in response to a scan signal supplied thereto. The center axis of the aperture formed in the aperture member is arithmetically determined on the basis of time-based variation in the quantity of the charged particles trapped by the aperture member during the scan operation. Further, deviation of the arithmetically determined center axis of the aperture from a reference axis is determined. The aperture member is slided on a plane extending perpendicularly to the center axis of the aperture to cancel out the deviation.

Charged particle beam apparatus

A specimen support comprises a pair of specimen attracting portions each having an electrode on the lower side thereof through an electrically insulating member. The pair of specimen attracting portions is arranged in opposed relation to one side of the specimen to be attracted thereto and is made of semiconductive dielectric material. A voltage is applied between the pair of specimen attracting portions thereby to attract the specimen to the portions electrostatically.

Specimen supporting device

An electron beam from an electron gun is made to focus on a first position by a focussing lens system. The focussed beam is then magnified and projected on a screen through a magnification lens system having an objective lens, an intermediate lens and a projection lens. The excitation is so variable that the electron beam may be focussed also on a second position behind the projection lens. A specimen is positioned at the first position for normal electron microscope analysis, while, for a scanning electron microscope analysis, another specimen is put at the second position.

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Katsuta, Japan

Yoshihisa Minamikawa