Maruzen Petrochemical Company, Limited

Scivax Corporation.

Yoshihisa Hayashida

Toshifumi Takemori

Takuro Satsuka

Yoshiaki Takaya

Minoru Iijima

Teruyo Ikeda

Masashi Iida

Satoru Tanaka

Takahisa Kusuura

Hirosuke Kawaguchi

Norio Futaesaku

Yuji Hashima

Anupam Mitra

Masao Kawahara

Akihiko Kanai

Kazuaki Uehara

An optical element material which is obtained by curing a resin composition for photoimprinting containing a photocurable monomer (A) of the formula (1) and a photocurable monomer (B) of the formula (2) in a weight ratio of from 30/70 to 87/13, and containing a photopolymerization initiator (C) in a content of from 0.01 to 30 parts by weight per 100 parts by weight of the total weight of the monomer (A) and the monomer (B), and which has a shrinkage on curing of at most 4.5%, and a method for producing it: 

Optical element material and method for producing same

A resin composition for photoimprinting, a cured product of the resin composition which is excellent in etching and heat resistance, and a pattern forming process using the resin composition are provided. The resin composition contains photocurable monomer (A) containing at least one carbazole compound of formula (I): a photocurable monomer (B) containing at least one compound of the following formulae (II), (III), and (IV): and a photopolymerization initiator (C). The weight ratio of the photocurable monomer (A) to the photocurable monomer (B) is from 30/70 to 87/13.

Resin composition for photoimprinting, pattern forming process and etching mask

There are provided an etching mask which has a superior thermal imprinting characteristic and also a good anti-etching characteristic, a base material with the etching mask, a microfabricated product to which those etching mask and base material are applied, and a production method of the microfabricated product. The etching mask formed of a thermoplastic resin containing at least one kind of skeleton expressed by a chemical formula (1) or a chemical formula (2) in a main chain wherein R, R, R, R, R, R, R, Rin the formulae (1), (2) can be different or same one another, each of which is a hydrogen atom, a deuterium atom, a hydrocarbon group having a carbon number of 1 to 15, a halogen atom, or a substituent group containing a hetero atom like oxygen or sulfur, and may form a ring structure one another and wherein m and n are integers equal to or greater than 0.

Etching mask, base material having etching mask, finely processed article, and method for production of finely processed article

The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.

Imprinting device and imprinting method

An olefin polymerization solid catalyst including a reaction product of a transition metal compound and an organoaluminum compound carried on a support having silica treated with an organoaluminum-oxy compound.

Olefin polymerization catalyst and olefin polymerization method using the same

A solid catalyst for olefin polymerization, which comprises a silica carrier (A) having a specific surface area of from 600 to 850 m /g, a pore volume of from 0.1 to 0.8 ml/g and an average particle size of from 2 to 12 &mgr;m, and an organoaluminum-oxy compound (B) and a Group IVB transition metal compound (C) containing a ligand having a cyclopentadienyl skeleton, supported on the carrier (A).

Catalyst for olefin polymerization and process for polymerizing olefin by means thereof

Growing community of inventors

Ichihara, Japan

Yoshihisa Hayashida