Fuji Xerox Co., Ltd.

Yoshihiro Yamamoto

Yoshihito Sekikawa

Kazuhiro Yoshino

Kazuhiro Sone

The exposure apparatus is provided with: an optical member; and a holding member that holds the optical member. Both end portions of the optical member are held by the holding member with a first adhering unit that is cured by light irradiation for first duration and a second adhering unit that is cured by light irradiation for second duration which is longer than the first duration.

Exposure apparatus, image forming apparatus, exposure apparatus manufacturing method and image forming method

A light scanning device includes: a housing; a light deflector provided at the housing, and rotating deflecting surfaces thereof around a rotating shaft, and deflecting light beams; plural light sources provided at the housing, and emitting the light beams in a direction that intersects the rotating shaft of the light deflector; an imaging optical system provided at the housing, and focusing each of the plural light beams deflected by the light deflector onto a surface-to-be-scanned; and an optical path changing member provided at the housing, and changing, to within a plane that includes the rotating axis of the light detector, optical paths of the light beams that are incident in the direction intersecting the rotating axis of the light detector.

Light scanning device and image forming device

An image forming apparatus includes an image carrier, a rotary developer unit having a developing roll opposed to the image carrier when located at a developing position and an exposure device for writing a latent image onto the image carrier, wherein an optical path from the exposure device to the image carrier passes within a circumscribed circle of the developing roll with the center of rotation of the rotary developer unit as the center of the circle. The image carrier is located so as to provide the developing position above a horizontal line passing the center of rotation of the rotary developer unit, and the exposure device is located so as to provide a beam exit position below the horizontal line.

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Saitama, Japan

Yoshihiro Yamamoto