Canon Kabushiki Kaisha

Yoshihiro Shiode

Noriyasu Hasegawa

Setsuo Yoshida

Zenichi Hamaya

Kazuhiko Mishima

Hironori Maeda

Ken Minoda

Tatsuya Hayashi

Seiya Miura

Hiroshi Morohoshi

Izumi Tsukamoto

Yoshio Kawanobe

There is provided a molding apparatus that molds a composition on a substrate by using a mold, characterized by including a control unit configured to control a process of forming a film of the composition between a first surface of the mold and the substrate by bringing the first surface into contact with the composition, and a deforming unit configured to deform the first surface into a convex shape with respect to a substrate side by applying power to a second surface of the mold on an opposite side to the first surface, wherein the control unit controls the deforming unit in the process so as to make power applied to the second surface by the deforming unit after contact between the first surface and the composition larger than power applied to the second surface by the deforming unit before the contact between the first surface and the composition.

Molding apparatus and article manufacturing method

An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, includes a mold holding unit including an actuator for moving mold, a force sensor detecting force generated by actuator, a position sensor measuring a position of mold, and a controlling unit controlling operation of mold holding unit. The controlling unit controls mold holding unit according to either a force imprint profile or a position imprint profile. The force imprint profile is for controlling movement of mold based on force generated by actuator and detected by force sensor. The position imprint profile is for controlling movement of mold based on position of mold measured by position sensor. When pattern of imprint material is formed on substrate, either force imprint profile or position imprint profile is selectable.

Imprint apparatus, imprint method, and article manufacturing method

An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a substrate stage mechanism having a substrate chuck configured to hold the substrate, a mold driver configured to drive the mold, and a controller configured to control, based on tilt information indicating a tilt of the substrate chuck which is caused by a force received from the mold driver, the mold driver so as to adjust a relative tilt of the mold with respect to the substrate in the imprint process.

Imprint apparatus, operation method of imprint apparatus, and article manufacturing method

An imprint method includes arranging imprint material as droplets on shot region of substrate, bringing the imprint material on part of the shot region into contact with pattern region of mold and then enlarging contact region between the imprint material and the pattern region to whole region of the shot region, and curing the imprint material. in the arranging, in each of local regions located in radial direction from the part of the shot region, the imprint material is arranged such that directional drop density of the imprint material on line parallel to direction orthogonal to the radial direction and with droplets of the imprint material present thereon is smaller than that of the imprint material on line parallel to the radial direction and with droplets of the imprint material present thereon.

Imprint method and article manufacturing method

The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising a control unit configured to control a process of deforming the mold into a convex shape and bringing the mold and the imprint material into contact with each other, wherein the control unit determines, based on information indicating a relationship between a relative tilt between the mold and the substrate, and a moment which fluctuates the relative tilt at a time of contact between the mold and the imprint material, a target relative tilt such that a moment generated at the time of contact between the mold and the imprint material falls within an allowable range, and starts contact between the mold and the imprint material after setting the relative tilt to the target relative tilt.

Imprint apparatus, imprint method, and method of manufacturing article

The present invention provides an imprint apparatus comprising a deforming unit configured to deform a pattern surface by applying a force to a mold, a measuring unit configured to measure a deformation amount of the pattern surface, a control unit configured to control the measuring unit to measure the deformation amount in each of a plurality of states in which a plurality of the forces are applied to the mold, a calculation unit configured to calculate a rate of change in the deformation amount as a function of a change in the force applied to the mold, and a calibration unit configured to calibrate a control profile describing a time in the imprint process, and the force applied to the mold, based on the rate of change in the deformation amount.

Imprint method

An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Imprint apparatus

The present invention provides an imprint apparatus which transfers a pattern onto a substrate by using a mold including a first surface with a pattern region where an unevenness pattern is formed, and a second surface opposite to the first surface, the mold including a first pattern group formed between the second surface and a surface of a convex portion in the unevenness pattern, or on the second surface, the apparatus comprising a second pattern group, a detection unit configured to detect a mark group formed by light having passed through the first pattern group and the second pattern group, and a calculation unit configured to calculate a position deviation between the first pattern group and the second pattern group from the mark group detected by the detection unit.

Imprint method for an imprint apparatus which transfers a pattern onto a substrate by using a mold

Imprint apparatus and method of manufacturing article

An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.

A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.

Position detection apparatus, imprint apparatus, and position detection method

The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Imprint apparatus and article manufacturing method

A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.

Growing community of inventors

Utsunomiya, Japan

Yoshihiro Shiode