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Tokyo, Japan

Yoshihiro Kamon

Average Co-Inventor Count = 4.26

ph-index = 2

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 13

Yoshihiro KamonTadayuki Fujiwara (4 patents)Yoshihiro KamonHikaru Momose (4 patents)Yoshihiro KamonRyuichi Ansai (3 patents)Yoshihiro KamonHideaki Kuwano (3 patents)Yoshihiro KamonAkihiro Goto (2 patents)Yoshihiro KamonSatoshi Sakuma (2 patents)Yoshihiro KamonTadahiro Ozawa (2 patents)Yoshihiro KamonJunichi Nakamura (1 patent)Yoshihiro KamonAsako Kaneko (1 patent)Yoshihiro KamonHiroyuki Mori (1 patent)Yoshihiro KamonYoko Tamura (11 patents)Yoshihiro KamonTakafumi Asai (3 patents)Yoshihiro KamonAtsushi Koizumi (2 patents)Yoshihiro KamonKazuaki Mukai (2 patents)Yoshihiro KamonTakeru Jo (2 patents)Yoshihiro KamonNaoshi Murata (1 patent)Yoshihiro KamonMasaaki Kiura (1 patent)Yoshihiro KamonAtsushi Ootake (1 patent)Yoshihiro KamonTakahiro Mukuda (1 patent)Yoshihiro KamonMasashi Serizawa (1 patent)Yoshihiro KamonKana Taniguchi (1 patent)Yoshihiro KamonToru Tokimitsu (1 patent)Yoshihiro KamonSho Katsumata (1 patent)Yoshihiro KamonRiina Kanbara (1 patent)Yoshihiro KamonYukiya Wakisaka (1 patent)Yoshihiro KamonMasatoshi Ura (1 patent)Yoshihiro KamonYoshihiro Kamon (12 patents)Tadayuki FujiwaraTadayuki Fujiwara (20 patents)Hikaru MomoseHikaru Momose (12 patents)Ryuichi AnsaiRyuichi Ansai (9 patents)Hideaki KuwanoHideaki Kuwano (3 patents)Akihiro GotoAkihiro Goto (103 patents)Satoshi SakumaSatoshi Sakuma (23 patents)Tadahiro OzawaTadahiro Ozawa (10 patents)Junichi NakamuraJunichi Nakamura (84 patents)Asako KanekoAsako Kaneko (21 patents)Hiroyuki MoriHiroyuki Mori (12 patents)Yoko TamuraYoko Tamura (11 patents)Takafumi AsaiTakafumi Asai (3 patents)Atsushi KoizumiAtsushi Koizumi (3 patents)Kazuaki MukaiKazuaki Mukai (2 patents)Takeru JoTakeru Jo (2 patents)Naoshi MurataNaoshi Murata (11 patents)Masaaki KiuraMasaaki Kiura (9 patents)Atsushi OotakeAtsushi Ootake (9 patents)Takahiro MukudaTakahiro Mukuda (7 patents)Masashi SerizawaMasashi Serizawa (6 patents)Kana TaniguchiKana Taniguchi (6 patents)Toru TokimitsuToru Tokimitsu (6 patents)Sho KatsumataSho Katsumata (5 patents)Riina KanbaraRiina Kanbara (4 patents)Yukiya WakisakaYukiya Wakisaka (4 patents)Masatoshi UraMasatoshi Ura (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Mitsubishi Chemical Corporation (8 from 2,346 patents)

2. Mitsubishi Rayon Company, Limited (4 from 1,357 patents)


12 patents:

1. 12454597 - Polyester resin

2. 12384863 - Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth)acrylic ester and production method therefor

3. 11845822 - Polymer, resist composition, method for manufacturing substrate having pattern formed therein, and (meth) acrylic ester and production method therefor

4. 11643489 - (Meth)acrylic copolymer, polymer solution, polymer-containing composition, anti-fouling coating composition, and method for producing (meth)acrylic copolymer

5. 11639423 - Resin composition, coating composition, and coated article

6. 11314179 - Polyester resin, method for producing polyester resin, and toner using said polyester resin

7. 10421705 - Carboxylic acid ester production method

8. 10125081 - Method for producing carboxylic acid anhydride and method for producing carboxylic acid ester

9. 7339014 - (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern

10. 7316884 - 5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process

11. 7041838 - (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns

12. 6927011 - Resins for resists and chemically amplifiable resist compositions

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