Nitto Chemical Industry Co., Ltd.

Sony Corporation

Shimadzu Corporation

Mitsubishi Rayon Company, Limited

Yoshihiro Hashimoto

Takakazu Endo

Noritaka Akita

Masayasu Suzuki

Koji Tamura

Takusei Sato

Yuji Hirata

Katsuhide Uchino

Makoto Takatoku

Yuji Hayashi

Wataru Mizunashi

Satofumi Koike

Makoto Kaneko

Fumiaki Abe

Shingo Makimura

Masayuki Iida

Kazuyoshi Yoshida

Mami Kato

Etsuko Kobayashi

Rikiya Takahashi

A liquid crystal display device is so constructed that the scattered or reflected incident rays and even the return rays are prevented from entering the transistor part. The device is free from the problem of photoelectric current leakage. The device comprises an active substrate with a pixel transistor TFT thereon and a counter substrate that faces the active substrate via liquid crystal therebetween, wherein light-shielding layers (upper light-shielding layer, and lower light-shielding layer) are formed to be adjacent to the side of the pixel transistor part that faces the counter substrate and adjacent to the side thereof that faces opposite to the counter substrate and wherein the upper light-shielding layer and the lead electrode shield the entire region except the pixel openings from the incident rays that enter the device through the counter substrate.

TFT-LCD having shielding layers on TFT-substrate

A substrate to be coated with a thin film is placed inside a vacuum chamber, an ECR plasma is generated and introduced into the vacuum chamber by means of a specified magnetic field generated inside the vacuum chamber and a reaction gas, as well as an inert gas, is introduced into the vacuum chamber while a negative DC voltage superposed with a high-frequency pulse with frequency 25-250 kHz is applied to the substrate by a voltage applying device such that the voltage of the substrate reaches a positive value instantaneously. The frequency of the superposed pulse is selected by using an ammeter to determine an optimum frequency for minimizing the load current of the voltage-applying circuit.

Apparatus for forming a thin film by plasma chemical vapor deposition

A thin film forming apparatus is formed of a vacuum chamber, a base plate holder for holding a base plate near a central part of the vacuum chamber, and ECR plasma generating devices respectively connected to both side portions of the vacuum chamber. A magnetic field generating device is situated adjacent to the vacuum chamber for generating a predetermined magnetic field in the vacuum chamber, and a gas introducing system is connected to the vacuum chamber for introducing a reaction gas into the vacuum chamber. Since the base plate holder has a shape corresponding to an external shape of the base plate, a distance between the base plate and the base plate holder is uniform. The films with uniform thicknesses can be formed on both surfaces of the base plate.

Thin film forming apparatus

Method of forming a thin film by plasma chemical vapor deposition

A process for producing an optically active aminopolycarboxylic acid, such as S,S-ethylenediamine-N,N'-disuccinic acid, from a mixture of a diamine, such as ethylenediamine, with fumaric acid using a microorganism having a lyase activity, wherein at least one metal ion selected from the group consisting of an alkaline earth metal, iron, zinc, copper, nickel, aluminum, titanium and manganese is added to the reaction system. According to this process, aminopolycarboxylic acids, such as S,S-ethylenediamine-N,N'-disuccinic acid, or metal complexes thereof, can be appropriately and efficiently produced while improving the reaction yield.

Process for producing optically active aminopolycarboxylic acid

The drive substrate and an opposed substrate are joined to each other through a gap in which a liquid crystal is held. Pixels electrodes are provided on the drive substrate in a matrix form and, an opposed electrode is formed on the entire surface of the opposed substrate. The drive substrate 1 has a plurality of thin film transistors each for switching one of the pixel electrodes, a first interlayer insulating film for covering the thin film transistors, interconnect electrodes patterned on the first interlayer insulating film and connected to the thin film transistors, a second interlayer insulating film for covering the interconnect electrodes and a black matrix patterned on the second interlayer insulating film and used for shielding the thin film transistors beneath the second interlayer insulating film. The black matrix is covered by a planerization layer and the pixel electrodes are patterned on the planerization layer. The pixel electrodes are connected to the interconnect electrodes through the black matrix 10 which is made up of a metal film. In a display device of the active matrix type, an on-chip black structure is thus obtained by providing a black matrix also referred to as a light-shielding layer on a drive substrate.

Display device

A biological process for predominantly producing an optically active .alpha.-hydroxycarboxylic acid having a phenyl group directly from a racemic .alpha.-hydroxynitrile or a mixture of an aldehyde corresponding to the nitrile and prussic acid as a substrate is disclosed, comprising reacting a microorganism belonging to the genus Rhodococcus, Alcaligenes, Brevibacterium or Pseudomonas with the substrate in a neutral to basic aqueous medium. A desired optically active .alpha.-hydroxycarboxylic acid having a phenyl group can be obtained quantitatively at a high optical purity.

Process for producing optically active .alpha.-hydroxycarboxylic acid

To give an electric shield function and an electric contact function to a light shielding film formed on a drive substrate. An active matrix display device includes a drive substrate 1 having pixels 4, an opposed substrate 2 having an opposed electrode 5, and a liquid crystal 3 held in a space defined between the drive substrate 1 and the opposed substrate 2. An upper layer portion of the drive substrate 1 includes pixel electrodes 6 formed individually for the pixels 4. A lower layer portion of the drive substrate 1 includes thin-film transistors 7 for individually driving the pixel electrodes 6, scanning lines 8, and signal lines 9. A light shielding film having conductivity is interposed between the upper layer portion and the lower layer portion, and is divided into mask shielding films 16M and pad shielding films 16P. Each mask shielding film 16M is continuously patterned along each row of the pixels 4 to partially shield at least the corresponding thin-film transistor 7. Each mask shielding film 16M is insulated from both the upper layer portion and the lower layer portion, and is maintained at a fixed potential. The pad shielding films 16P are discretely patterned for the individual pixels 4, and each pad shielding film 16P is located at a contact portion C between the corresponding pixel electrode 6 and the corresponding thin-film transistor 7 to provide electrical connection therebetween and light shielding.

Active matrix display device

A method of producing an optically active amino acid is disclosed which comprises converting a mixture of an amino group-containing compound, e.g., an alkanediamine, and fumaric acid into an optically active amino acid by the action of a microorganism. The method is useful in industrially producing an optically active amino acid from the inexpensive starting materials, i.e., fumaric acid and an amino compound, under mild conditions of ordinary temperature and ordinary pressure.

Production of alkylene or phenylenediamine disuccinic acid from fumaric

A biological process for predominantly producing an optically active .alpha.-hydroxycarboxylic acid having a phenyl group directly from a racemic .alpha.-hydroxynitrile or a mixture of an aldehyde corresponding to the nitrile and prussic acid as a substrate is disclosed, comprising reacting a microorganism belonging to the genus Gordona with the substrate in a neutral to basic aqueous medium. A desired optically active .alpha.-hydroxycarboxylic acid having a phenyl group can be obtained quantitatively at a high optical purity.

Process for producing optically active a-hydroxycarboxylic acid having

A process for the production of .alpha.-hydroxy acids or .alpha.-hydroxyamides in which an .alpha.-hydroxynitrile compound or a mixture consisting of an aldehyde and prussic acid, which corresponds to the nitrile compound, is allowed to undergo a microbial reaction to produce the corresponding .alpha.-hydroxy acid or .alpha.-hydroxyamide, wherein the improvement resides in that phosphite ions or hypophosphite ions are allowed to be present in the reaction system. According to the present invention, since hydrolysis or hydration of nitrile compounds can be carried out by constantly keeping a low concentration level of aldehydes which are considered to be a cause of the enzyme inhibition in the reaction system, the enzyme activity can be maintained stably for a prolonged period of time and the formed acids or amides can therefore be accumulated in a high concentration.

Growing community of inventors

Kanagawa, Japan

Yoshihiro Hashimoto