Hitachi-kokusai Electric Inc.

Kokusai Electric Corporation

Yoshihiko Nakagawa

Masaaki Ueno

Masashi Sugishita

Tsukasa Iida

Kenichi Fujimoto

Susumu Nishiura

Hiroyuki Mitsui

Hiroshi Kotani

Masao Aoyama

A substrate processing apparatus includes a process chamber configured to process a substrate, a carrier mounting part configured to mount a carrier which accommodates the substrate, the substrate capable of being brought into and out of the carrier when a door of the carrier mounted on the carrier mounting part is opened, a carrier opener configured to open and close the door of the carrier mounted on the carrier mounting part, a purge gas supply part configured to supply an inert gas into the carrier with the door kept opened, and a control part configured to perform control so as to carry out at least one inert gas purge among a load purge, an unload purge and a standby purge.

Substrate processing apparatus, gas-purging method, method for manufacturing semiconductor device, and recording medium containing abnormality-processing program

To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.

Substrate processing apparatus and substrate processing system

A substrate processing apparatus gives a user notice to prevent removal of a storage medium and provides a screen for determining whether the storage medium is removable. The apparatus controls display of the screen for manipulating substrate processing information and includes a part to which an external storage device is attached. The screen includes: a title panel displayed at an upper region of the screen; an information panel controlling or monitoring a task; and a navigation panel at a lower region of the screen. When the external storage device is attached to the part, an external storage device remove button is enabled by displaying the remove button on the navigation panel to indicate the external storage device is attached to the part. When the external storage device is not attached to the part, the remove button is disabled by displaying the remove button in a like color as the background.

Substrate processing apparatus and display method of substrate processing apparatus

Provided are a substrate processing apparatus, a semiconductor device manufacturing method, and a temperature controlling method, which are adapted to improve equipment operational rate. A calculation parameter computing unit computes a calculation parameter using at least a first calculation parameter correction value determined by a first calculation parameter setting unit based on an accumulated film thickness on a reaction vessel, a second calculation parameter correction value determined by a second calculation parameter setting unit based on an accumulated film thickness on a filler wafer, and a third calculation parameter correction value determined by a third calculation parameter setting unit based on the number of filler wafers. Product and filler wafers are accommodated and heat-treated in the reaction vessel while controlling a heating unit using calculation results obtained using at least the calculation parameter and deviation between a set temperature and a temperature detected in the heating unit by a temperature detector.

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Toyama, Japan

Yoshihiko Nakagawa