Micron Technology Incorporated

Toshiba Memory Corporation

Kabushiki Kaisha Toshiba

Kioxia Corporation

Yoshihiko Kamata

Yoshiaki Fukuzumi

Mario Sako

Koji Kato

Jun Fujiki

Shuji Tanaka

Masanobu Saito

Masashi Yoshida

Naofumi Abiko

Takuyo Kodama

Mai Shimizu

Yoko Deguchi

Tsukasa Kobayashi

Koichi Kawai

Tomoko Ogura Iwasaki

Yasuhiko Honda

Yuki Shimizu

Yuui Shimizu

Yoshinao Suzuki

Hideyuki Kataoka

Takumi Fujimoto

Yuki Ishizaki

Koji Tabata

Tomoharu Tanaka

Haitao Liu

Aaron S Yip

Richard J Hill

Kosuke Yanagidaira

Masahiro Yoshihara

Hao Nguyen

Dheeraj Srinivasan

Erwin E Yu

Lawrence Celso Miranda

Sheyang Ning

Naveen Kaushik

Kyle A Ritter

Tomoyuki Hamano

Tamotsu Murakoshi

Yuko Yokota

Akira Goda

Noriyasu Kumazaki

Hiromitsu Komai

Shirou Fujita

Takayuki Harima

Jin Kashiwagi

Masaaki Kuwagata

Hiroyuki Kaga

Fumitaka Taniwaki

Hirotaka Kariya

Jun Fujimoto

Atsushi Okuyama

A memory device includes an array of strings of memory cells, a local bitline coupled with a plurality of the strings of memory cells, and a sense transistor having a gate terminal coupled with the local bitline. The memory device further includes a series of transistors have a data read path between a source line and the sense transistor and between the sense transistor and a global bitline that is coupled with a page buffer. A micropump is integrated within the series of transistors. Control logic is coupled with the series of transistors and to, during a read operation of a memory cell of the array and in response to the sense transistor turning on, activate the micropump to cause a constant read current to flow between the global bitline and the source line.

Capacitive sensing with a micro pump in a memory device

A microelectronic device comprises a stack structure, pillar structures, a conductive plug structure, a sense transistor, and selector transistors. The stack structure comprises a vertically alternating sequence of conductive material and insulative material, and is divided into blocks separated by dielectric slot structures. The blocks individually include sub-blocks horizontally extending in parallel with one another. The pillar structures vertically extend through one of the blocks of the stack structure. Each pillar structure of a group of the pillar structures is positioned within a different one of the sub-blocks of the one of the blocks than each other pillar structure of the group. The conductive plug structure is coupled to multiple of the pillar structures of the group of the pillar structures. The sense transistor is gated by the conductive plug structure. The selector transistors couple the sense transistor to a read source line structure and a digit line structure.

Microelectronic devices, and related memory devices and electronic systems

According to one embodiment, a semiconductor memory device includes first and second memory cells, a first word line, first and second sense amplifiers, first and second bit lines, a controller. The first and second sense amplifiers each include first and second transistors. The first bit line is connected between the first memory cell and the first transistor. The second bit line is connected between the second memory cell and the second transistor. In the read operation, the controller is configured to apply a kick voltage to the first word line before applying the read voltage to the first word line, and to apply a first voltage to a gate of the first transistor and a second voltage to a gate of the second transistor while applying the kick voltage to the first word line.

Semiconductor memory device

Memories might include a controller configured to cause the memory to apply a first voltage level indicative of a data state of a memory cell of an array of memory cells to a control gate of a transistor, retain the first voltage level on the control gate of the transistor, connect a first source/drain of the transistor to a data line corresponding to the memory cell while applying a second voltage level to a second source/drain of the transistor and while retaining the first voltage level on the control gate of the transistor, and apply a programming pulse to a control gate of the memory cell while the data line is connected to the first source/drain of the transistor.

Memory for programming data states of memory cells

A memory device includes a sense amplifier (SA) latch coupled to a sense node. A dynamic latch (DL) is connected to the SA latch and coupled to sense node. A sense line includes the sense node and is selectively connected to the SA latch, the DL, and a bit line that is coupled to a memory cell string. Control logic is coupled to the SA latch and the DL, and to: cause a pre-program verify voltage to boost the sense node; and, in response to detecting a high bit value stored in SA latch, cause a voltage to turn on set transistor(s) of DL so that a first bias voltage or a second bias voltage is stored at a latch transistor. The first bias voltage is useable for slow programming of a selected memory cell and the second bias voltage is useable for fast programming of the selected memory cell.

Memory devices using a dynamic latch to provide multiple bias voltages

A semiconductor storage device includes a first memory cell electrically connected to a first bit line and a first word line, a second memory cell electrically connected to a second bit line and the first word line, and a first circuit configured to supply voltages to the first word line. During a reading operation to read a page of memory cells including the first memory cell and the second memory cell, the first circuit supplies a first voltage to the first word line while the first memory cell is selected as a read target during a first time period, and supplies a second voltage greater than the first voltage to the first word line while the second memory cell is selected as a read target during a second time period that is different from the first time period, and directly thereafter, supplies the first voltage to the first word line.

Semiconductor storage device

Methods of forming integrated circuit structures for a capacitive sense NAND memory include forming a first semiconductor overlying a dielectric, forming a second semiconductor to be in contact with a first end of the first semiconductor, forming a third semiconductor to be in contact with a second end of the first semiconductor opposite the first end of the first semiconductor, forming a vertical channel material structure overlying the first semiconductor and having a channel material capacitively coupled to the first semiconductor, and forming a plurality of series-connected field-effect transistors adjacent the vertical channel material structure.

Methods of forming integrated circuit structures for capacitive sense NAND memory

Memory devices might include a first storage element, a second storage element, a data line, and a controller. The first storage element is to store a first data bit. The second storage element is to store a second data bit. The data line is selectively connected to the first storage element, the second storage element, and a memory cell. The controller is configured to apply one of four voltage levels to the data line based on the first data bit and the second data bit.

Memory devices with four data line bias levels

Memory devices might include an array of memory cells, a plurality of access lines connected to the array of memory cells, a plurality of data lines connected to the array of memory cells, a plurality of shield lines, and control logic. The plurality of shield lines might be interleaved with the plurality of data lines. The control logic might be configured to implement a program verify operation of respective memory cells of the array of memory cells connected to a selected access line including charging the plurality of shield lines to a first voltage level, discharging the plurality of shield lines to a voltage level less than the first voltage level, and sensing a voltage level on each data line to determine whether each respective memory cell coupled to the selected access line has been programmed to a target level for the respective memory cell.

Memory devices for program verify operations

A microelectronic device comprises first digit lines, second digit lines, and multiplexer devices. The first digit lines are coupled to strings of memory cells. The second digit lines are coupled to additional strings of memory cells. The second digit lines are offset from the first digit lines in a first horizontal direction and are substantially aligned with the first digit lines in a second horizontal direction orthogonal to the first horizontal direction. The multiplexer devices are horizontally interposed between the first digit lines and the second digit lines in the first horizontal direction. The multiplexer devices are in electrical communication with the first digit lines, the second digit lines, and page buffer devices. Additional microelectronic devices, memory devices, and electronic systems are also described.

Memory devices including multiplexer devices, and related electronic systems

A semiconductor memory device includes a substrate, first and second P-type well regions on the substrate, an N-type well region on the substrate and sandwiched between the first and second P-type well regions, a first peripheral circuit on a region of the first P-type well region adjacent to the N-type well region and supplied with a reference voltage via a first wiring, and a second peripheral circuit on a region of the second P-type well region adjacent to the N-type well region and supplied with a reference voltage via a second wiring.

Some embodiments include an assembly having channel-material-structures, and having memory cells along the channel-material-structures. The memory cells include charge-storage-material. Linear-conductive-structures are vertically offset from the channel-material-structures and are electrically coupled with the channel-material-structures. Intervening regions are between the linear-conductive-structures. Conductive-shield-structures are within the intervening regions. The conductive-shield-structures are electrically coupled with a reference-voltage-source.

Integrated assemblies having conductive-shield-structures between linear-conductive-structures

Arrays of memory cells might include a first upper data line, a second upper data line, a lower data line, a first pass gate selectively connected to the lower data line, a second pass gate connected to the first pass gate and selectively connected to the lower data line, a third pass gate selectively connected to the lower data line, a fourth pass gate connected to the third pass gate and selectively connected to the lower data line, unit column structures selectively connected to a respective one of the upper data lines and capacitively coupled to a first channel of a respective one of the pass gates, and control lines capacitively coupled to a second channel of a respective one of the pass gates.

Memory array structures for capacitive sense NAND memory

Growing community of inventors

Yokohama, Japan

Yoshihiko Kamata