Futaba Denshi Kogyo K.k.

Agency of Industrial Science and Technology

Yoshihiko Hirata

Shigeo Itoh

Teruo Watanabe

Hiroshi Nakagawa

Takeshi Tonegawa

Yoshio Makita

Kazuhiko Tsuburaya

Akira Kadowaki

Susumu Takada

Method for forming a vacuum hermetic vessel. Plural exhaust holes are formed in the first main substrate at a number of positions. A second main substrate is superposed over the first main substrate. The two substrates are hermetically sealed. The two substrates are cut at predetermined positions to form individual vessels. Lead-out electrodes are formed on both the first and second substrates and are not covered by another substrate. The vessels are evacuated and sealed using exhaust tubes.

Method of manufacturing vacuum hermetic vessels

A field emission element including an electrode structure made of a thin film exhibiting increased adhesive strength. A thin film of niobium nitride (NbN) is formed on a glass substrate by sputtering or the like. The NbN film exhibits increased adhesive strength to a degree sufficient to prevent etching for formation of the film into electrodes from causing peeling of the film.

Vacuum airtight device having NbN electrode structure incorporated

Growing community of inventors

Mobara, Japan

Yoshihiko Hirata