Sharp Kabushiki Kaisha Corporation

Yoshihide Iwazaki

Hiroyuki Nakanishi

Toshiya Ishio

Katsunobu Mori

Shinji Suminoe

Takamasa Tanaka

A manufacturing method of a semiconductor device, comprising the steps of forming an insulation layer, which has an opening section in an area including an area on an electrode pad, on a top surface of the semiconductor substrate on which the electrode pad is formed; at least forming a first barrier metal layer, which becomes a part of a leading wiring layer, in an inner peripheral surface of the opening section including the top surface of the electrode pad; at least forming a main conductor layer, which becomes a part of the leading wiring layer, in an area surrounded by the first barrier metal layer in the opening section; eliminating an upper portion of the main conductor layer at least to a position at which the first barrier metal layer is exposed, and forming a second barrier metal layer, which becomes a part of the leading wiring layer, so as to cover the whole top surface of the main conductor layer.

Semiconductor device having a leading wiring layer

A leading wiring layer is provided with a main conductor layer, a first barrier metal layer for covering bottom and side surfaces of the main conductor layer, and a second barrier metal layer for covering a top surface of the main conductor layer. This ensures the respective barrier metal layers to cover entire surroundings including the side, bottom and top surfaces of the main conductor layer.

A semiconductor device includes (i) spacers between a first electronic component and a second electronic component facing each other, for keeping a distance between the first and second electronic components constant and (ii) combining parts for combining the first electronic component with the second electronic component. The spacers are made of liquid resin material made of thermosetting resin, and the combining parts are made of liquid conductive combining material including metal and thermosetting resin. A manufacturing method of the semiconductor device includes the steps of: forming the spacers on first electrode pads by hardening the liquid resin material; providing the liquid conductive combining material on either the first electrode pads or second electrode pads; aligning the first electronic component with the second electronic component so that (i) the spacers contact with the second electrode pads and (ii) the liquid conductive combining material contact with either at least a part of one the first electrode pads or at least part of one of the second electrode pads; and combining the first electronic component with the second electronic component by hardening the liquid conductive combining material. The steps above are carried out in this order.

Semiconductor device in which a plurality of electronic components are combined with each other

A semiconductor chip of the present invention is so arranged that a front face on which an element circuit is formed has electrode pads and a side face and a back face are coated with a shielding layer for shielding electromagnetic waves. With this, it is possible to provide a semiconductor element capable of being easily manufactured into a smaller semiconductor device compared with a conventional semiconductor device equipped with a shielding cap; a semiconductor device; and a method for manufacturing a semiconductor element.

Semiconductor element with electromagnetic shielding layer on back/side face(s) thereof

A manufacturing method of a semiconductor device for providing wires on a front surface of a semiconductor wafer by providing a plating layer, in which conductive layers provided on the front and back surfaces of the semiconductor wafer are electrically conducted by solder filled in its through-holes, and electrolytic plating is carried out by electrically connecting cathode terminals of an electrolytic plating apparatus and the conductive layer provided on the back surface of the semiconductor wafer which is provided with a mask on the conductive layer provided on its front surface.

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Tenri, Japan

Yoshihide Iwazaki