Kabushiki Kaisha Toshiba

Toshiba Electronic Devices & Storage Corporation

Yamazaki Mazak Corporation

Nippon Leakless Industry Co., Ltd.

Sanshin Kogyo Co., Ltd.

Other

Honda Motor Co., Ltd.

Sanshin Industries Co., Ltd.

Yoshiharu Takada

Sakae Hatano

Masahiko Kuraguchi

Akira Yoshioka

Hiroyuki Nakano

Shingo Masuko

Tsunehiko Abe

Kazuo Fujimura

Hideharu Kojima

Kiyokazu Kainuma

Hisashi Yoshida

Yoshinori Mori

Kazuaki Shiotani

Isao Kanematsu

Kazuo Asano

Ichiro Mizushima

Takeshi Shibata

Kentaro Ikeda

Tatsuya Ohguro

Tatsuya Nishiwaki

Shingo Sato

Kohei Oasa

Mayumi Morizuka

Kentaro Ichinoseki

Kikuo Aida

Norihiko Shimizu

Shinsuke Mochizuki

Kiyoshi Suzuki

Takeo Nakagawa

Kenji Okubo

Yasuaki Nagai

Shingo Watanabe

Tetsutaro Uematsu

Kanji Sato

Tunehiko Abe

Tomokazu Nakanishi

Ichiro Goto

Munetada Kurita

A semiconductor device includes a semiconductor chip and a metal plate. The semiconductor chip has first and second surfaces, four side surface, four corners, four sides. The four side surfaces connect the first surface and the second surface. Two of the four side surfaces contact each other at one of the four corners. The four side surfaces contact the second surface at the four sides. The first and second electrodes are provided at the first front side. The metal plate is connected to the second surface side of the semiconductor chip. The metal plate includes third and fourth surfaces, and a through-hole or a notch. The third surface is connected to the second surface of the semiconductor chip. The fourth surface is provided at a side opposite to the third surface. The through-hole or the notch extends through the metal plate from the fourth surface to the third surface.

Semiconductor device

A semiconductor device includes a first lead portion and a second lead portion spaced from each other in a first direction. A semiconductor chip is mounted to the first lead portion. A first connector has a first portion contacting a second electrode on the chip and a second portion connected to the second lead portion. A second connector has third portion that contacts the second electrode, but at a position further away than the first portion, and a fourth portion connected to the second portion. At least a part of the second connector overlaps a part of the first connector between the first lead portion and the second lead portion.

Semiconductor device having second connector that overlaps a part of first connector

A semiconductor substrate according to an embodiment includes a substrate having a first substrate surface, the substrate having a first outer diameter; a metal layer provided on the first substrate surface, the metal layer having a second outer diameter smaller than the first outer diameter; a first adhesive tape having a ring shape, the ring shape having a third outer diameter smaller than the first outer diameter and larger than the second outer diameter, the ring shape having a third inner diameter smaller than the second outer diameter, the first adhesive tape having a first base material, the first base material having a first surface and a second surface opposed to the first surface, the first adhesive tape having a first adhesive layer provided on the first surface, the first adhesive tape being attached to the first substrate surface and the metal layer through the first adhesive layer; and a second adhesive tape having a fourth outer diameter smaller than the first outer diameter and larger than the third inner diameter, the second adhesive tape having a second base material having a third surface and a fourth surface opposed to the third surface, the second adhesive tape having a second adhesive layer provided on the third surface, the second adhesive tape being attached to the second surface and the metal layer through the second adhesive layer.

Semiconductor substrate and method of manufacturing semiconductor device

A semiconductor device according to an embodiment includes a semiconductor substrate having a first plane and a second plane, a semiconductor element provided in the semiconductor substrate, the semiconductor element including a gate insulating film provided in the first plane, a first electrode provided on the first plane, a second electrode provided on the first electrode, the second electrode including a first metal material, the second electrode having a film thickness of (65 [g&#xb7;&#x3bc;m&#xb7;cm])/(density of the first metal material [g&#xb7;cm]) or more, a first solder portion provided on the second electrode, a third electrode provided on the first solder portion, a fourth electrode provided on the first plane, a fifth electrode provided on the fourth electrode, the fifth electrode including a second metal material, the fifth electrode having a film thickness of (65 [g&#xb7;&#x3bc;m&#xb7;cm])/(density of the second metal material [g&#xb7;cm]) or more, a second solder portion provided on the fifth electrode, and a sixth electrode provided on the second solder portion.

According to one embodiment, a semiconductor device includes a semiconductor chip, and a die pad. The die pad has a first surface. The semiconductor chip is bonded on the first surface using a paste including a metal particle. A concave structure is provided in the first surface. The concave structure is positioned directly under each of a plurality of sides of the semiconductor chip and extends along each of the plurality of sides.

Chip attached to a die pad having a concave structure

According to an embodiment, a semiconductor device includes a silicon substrate, a device layer, and a lower layer. The device layer is formed on an upper surface of the silicon substrate. The lower layer is formed on a lower surface of the silicon substrate and has a side surface connecting to a side surface of the silicon substrate. At least a pair of side surfaces of the semiconductor device has a curved shape widening from an upper side toward a lower side.

Semiconductor device and dicing method

According to one embodiment, a semiconductor device includes a semiconductor layer, an electrode, and an insulating portion. The semiconductor layer has a first surface. The electrode is provided on the first surface of the semiconductor layer. The insulating portion includes a first layer and a second layer. The first layer covers the electrode on the first surface of the semiconductor layer and has a first internal stress along the first surface. The second layer is provided on the first layer and has a second internal stress in a reverse direction of the first internal stress.

A semiconductor device including: a semiconductor element, a substrate having a first surface on which the semiconductor element is provided, and a second surface located opposite the first surface, a metal species provided on the second surface, and a plated metal portion provided at least in part on the second surface on the metal species. The semiconductor device further includes a first region where the plated metal portion is provided and a second region where the plated metal portion is not provided are alternately arranged at a peripheral portion of the second surface.

Semiconductor device and manufacturing method thereof

A semiconductor device includes a semiconductor region, a first electrode provided on the semiconductor region, a second electrode provided on the semiconductor region adjacent to and spaced from a side of the first electrode, and containing an identical material as the material of the first electrode, a third electrode provided on the semiconductor region in a location between the first electrode and the second electrode, a first insulating film provided between the semiconductor region and the third electrode, and a fourth electrode connected to the third electrode containing the same material as the material of the first electrode and the second electrode.

According to one embodiment, a nitride semiconductor device includes a substrate; semiconductor stacked layers including a nitride semiconductor provided on the substrate, and having a buffer layer, a carrier running layer provided on the buffer layer, and a barrier layer provided on the carrier running layer; a source electrode and a drain electrode provided on the semiconductor stacked layers and in contact with the semiconductor stacked layers; and a gate electrode provided on the semiconductor stacked layers and provided between the source electrode and the drain electrode. The gate electrode has a stacked structure, and a gate metal layer, a barrier metal layer, a first interconnection layer, and a second interconnection layer including Al are sequentially stacked from a side of a surface of the semiconductor stacked layers in the stacked structure.

Nitride semiconductor device and method for manufacturing same

Semiconductor device in which internal stress in a layer is relaxed to suppress warping

According to an embodiment, a semiconductor device includes a first layer including a first nitride semiconductor, a second layer provided on the first layer and including a second nitride semiconductor having a wider bandgap than the first nitride semiconductor. The device also includes a source electrode and a drain electrode provided on the second layer; and a gate electrode provided on the second layer and located between the source electrode and the drain electrode. The second layer includes a first region between the gate electrode and the drain electrode, the first region being selectively provided in a surface of the second layer and contains fluorine. A concentration of fluorine in the first region is higher than a concentration of fluorine in a portion underneath the gate electrode in the second layer.

Semiconductor device and method for manufacturing same

Disclosed is a semiconductor device including: a semiconductor substrate; a field effect transistor formed on the semiconductor substrate; and a diode forming area adjacent to a forming area of the field effect transistor, wherein the diode forming area is insulated from the forming area of the field effect transistor on the semiconductor substrate, the diode forming area includes an anode electrode and a cathode electrode arranged side by side in a multi-finger shape, and the anode electrode and the cathode electrode are formed in a direction different from directions of a gate electrode, a source electrode, and a drain electrode of the field effect transistor arranged side by side in a multi-finger shape.

Semiconductor device with gate protection diode

Growing community of inventors

Kanagawa-ken, Japan

Yoshiharu Takada