Gigaphoton Inc.

Komatsu Corporation

Dexerials Corporation

Osaka University

Sony Chemical & Information Device Corporation

Gigahoton Inc.

Yoshifumi Ueno

Akira Endo

Georg Soumagne

Takayuki Yabu

Osamu Wakabayashi

Akira Sumitani

Hiroshi Komori

Tamotsu Abe

Shinji Nagai

Yuta Takashima

Tatsuya Yanagida

Yuichi Nishimura

Yasushi Ito

Tsukasa Hori

Hirokazu Hosoda

Kiyoharu Nakao

Youichi Sasaki

Masato Moriya

Toru Suzuki

Hideo Hoshino

Takashi Saito

Tomomitsu Hori

Yoshiaki Kurosawa

Katsunobu Nishihara

Hirofumi Tani

Young Gwang Kang

Masanori Nunami

Masaki Nakano

Kouji Kakizaki

Takashi Suganuma

Atsushi Ueda

Noriaki Kudo

Takuya Ishii

Masahiko Ando

Hiroshi Takamatsu

Takeshi Kodama

Gota Niimi

Kotaro Miyashita

Teruo Hiyama

Go Shirozu

Kouichi Satou

Akihiro Yamazaki

An EUV light generation apparatus includes a chamber; a prepulse laser outputting prepulse laser light; a main pulse laser outputting main pulse laser light; a combiner combining optical paths of the prepulse laser light and the main pulse laser light; a light concentrating unit concentrating, on the target, the prepulse laser light and the main pulse laser light having the optical paths combined; a stage changing a position of the light concentrating unit; a first actuator changing a travel direction of the main pulse laser light; an EUV light sensor detecting EUV energy; a laser energy sensor detecting pulse energy of the main pulse laser light; and an EUV light generation control unit controlling the stage so that temporal variation of the EUV energy decreases and controlling the first actuator so that a ratio of the EUV energy to the pulse energy increases.

EUV light generation apparatus, electronic device manufacturing method, and inspection method

A tin trap device for collecting tin in a chamber device which causes tin to be turned into plasma with laser light in an internal space thereof may include a housing provided with a gas inlet port through which exhaust gas in the chamber device flows and a gas exhaust port through which the exhaust gas is exhausted; and a main heater arranged in the housing, configured to have a temperature equal to or higher than the melting point of tin and lower than the boiling point thereof, and having a projection surface projected toward a direction in which the exhaust gas flows in the gas inlet port cover the gas inlet port.

Tin trap device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

An extreme ultraviolet light generation system may include a laser device configured to emit pulse laser light, an EUV light concentrating mirror configured to reflect and concentrate extreme ultraviolet light generated by irradiating a target with the pulse laser light, and a processor configured to receive a first energy parameter of the extreme ultraviolet light and control an irradiation frequency of the pulse laser light with which the target is irradiated so that change in a second energy parameter related to energy per unit time of the extreme ultraviolet light reflected by the EUV light concentrating mirror is suppressed.

Extreme ultraviolet light generation system and electronic device manufacturing method

A laser system according to the present disclosure includes: a laser apparatus configured to emit a laser beam; a transmission optical system disposed on a path between the laser apparatus and a target supplied into an EUV chamber in which EUV light is generated; a reflection optical system configured to reflect, toward the target, the laser beam from the transmission optical system; a first sensor configured to detect the laser beam traveling from the laser apparatus toward the reflection optical system; a second sensor configured to detect return light of the laser beam reflected by the reflection optical system and traveling backward to the laser apparatus; and a control unit configured to determine that the reflection optical system is damaged when no anomaly of the laser beam is detected and a light amount of the return light exceeds a predetermined light amount value.

Laser system and extreme ultraviolet light generation system

An extreme ultraviolet light generation system may include an irradiation position adjustment mechanism adjusting an irradiation position of the laser light; an extreme ultraviolet light sensor measuring energy of extreme ultraviolet light; a return light sensor measuring energy of return light traveling backward on the laser light path; and a processor controlling the irradiation position adjustment mechanism. The processor stores measurement results of the extreme ultraviolet light energy and the return light energy in association with each of the irradiation positions, limits a shift region of the irradiation position based on comparison between the return light energy and a threshold, and determines a target irradiation position based on the association between the irradiation position and the extreme ultraviolet light energy in a region where the return light energy does not exceed the threshold, and controlling the irradiation position adjustment mechanism in accordance with the target irradiation position.

A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

Laser apparatus and EUV light generation system

An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.

Extreme ultraviolet light generation apparatus and electronic device manufacturing method

A target supply device according to an aspect of the present disclosure includes a vibration element configured to generate a droplet by vibrating a target substance to be output from a nozzle, a droplet detection unit configured to detect the droplet, and a control unit. A first detection threshold and a second detection threshold to be compared with a detection signal from the droplet detection unit are set to the control unit. The first detection threshold is used to generate a light emission trigger for a laser beam. The second detection threshold has a smaller absolute value from a base line of the detection signal than the first detection threshold. The control unitcalculates an evaluation parameter for a satellite based on the detection signal and the second detection threshold, and determines a duty value of an electric signal suitable for operation of the vibration element based on the evaluation parameter.

Target supply device, extreme ultraviolet light generation device, and target supply method

An EUV light generating apparatus includes: EUV light sensors configured to measure energy of EUV light from mutually different directions, the EUV light being generated by applying laser light to a target supplied to a predetermined region in a chamber; an application position adjusting unit configured to adjust an application position of the laser light to the target supplied to the predetermined region; and a controller configured to control the application position adjusting unit such that a centroid of the EUV light becomes a target desired centroid, the centroid of the EUV light being specified from measurement results of the EUV light sensors. The controller calibrates the target desired centroid based on EUV light centroids obtained from the energy of the EUV light measured by the EUV light sensors, and a parameter related to the measured energy of the EUV light corresponding to the EUV light centroids.

Extreme ultraviolet (EUV) light generating apparatus and control method for centroid of EUV light

The extreme ultraviolet light generation device includes a chamber having a first through-hole that allows a pulse laser beam to enter the chamber, a target supply unit held by the chamber and configured to output a target toward a predetermined region in the chamber, a shield member surrounding the predetermined region in the chamber and having a target path that allows the target outputted from the target supply unit to pass toward the predetermined region, and a tubular member surrounding at least a part of an upstream portion of the trajectory of the target outputted from the target supply unit toward the predetermined region, the upstream portion being upstream from the target path of the shield member.

Extreme ultraviolet light generation device

Provided is an illumination device that can be made thin and increases the efficiency of extracting light to the outside. The present invention is provided with: light-emitting structures wherein a blue light-emitting element is embedded in a transparent resin having a convex surface shape; a substrate wherein the light-emitting structures are disposed two-dimensionally; a diffuser plate that diffuses the blue light of the blue light-emitting elements; and a fluorescent sheet that is disposed spaced from the substrate and that contains a particulate fluorescent body that obtains a white light from the blue light of the blue light-emitting elements.

Illumination apparatus

An extreme ultraviolet light generating apparatus includes a laser device, a target detector, and a controller. The laser device emits a pulsed laser beam. The target detector detects a target substance supplied as an application target for the laser beam to the inside of a chamber. The controller controls the laser device based on a burst signal in which a burst period and an idle period are repeated. In the burst period, an extreme ultraviolet light beam has to be generated. In the idle period, the generation of the extreme ultraviolet light beam has to be paused. When a size of a target substance detected at the target detector in the idle period is greater than a predetermined size, the controller may reduce an intensity of a laser beam entering the inside of the chamber from the laser device.

Extreme ultraviolet light generation device and method for controlling extreme ultraviolet light generation device

An extreme ultraviolet light generation device includes: an EUV sensor configured to measure energy of extreme ultraviolet light generated when a target is irradiated with a plurality of laser beams in a predetermined region in a chamber; an irradiation position adjustment unit configured to adjust at least one of irradiation positions of the laser beams with which the target is irradiated in the predetermined region; an irradiation timing adjustment unit configured to adjust at least one of irradiation timings of the laser beams with which the target is irradiated in the predetermined region; and a control unit configured to control the irradiation position adjustment unit and the irradiation timing adjustment unit, the control unit controlling the irradiation position adjustment unit and then controlling the irradiation timing adjustment unit based on a measurement result of the EUV sensor.

The stability of operations of an EUV light generating apparatus is improved. A droplet detector may include: a light source unit configured to emit illuminating light onto a droplet, which is output into a chamber and generate extreme ultraviolet light when irradiated with a laser beam; a light receiving unit configured to receive the illuminating light and to detect changes in light intensities; and a timing determining circuit configured to output a droplet detection signal that indicates that the droplet has been detected at a predetermined position within the chamber, based on a first timing at which the light intensity of the illuminating light decreases due to the droplet being irradiated therewith and a second timing at which the light intensity of the illuminating light increases.

Droplet detector and extreme ultraviolet light generating apparatus

An extreme ultraviolet light generating apparatus includes a light collecting mirror that reflects and focuses extreme ultraviolet light, and a magnet that generates a magnetic field. The light collecting mirror includes a first mirror portion that includes a first reflective surface formed by a portion of a spheroidal surface, and a second mirror portion that includes a second reflective surface having a focal point at substantially the same position as a focal point of the first reflective surface, formed by a portion of a spheroidal surface different from that of the first reflective surface. The second reflective surface is provided at a position at which a magnetic flux density caused by the magnetic field is lower than that of the first reflective surface.

Extreme ultraviolet light generating apparatus

Growing community of inventors

Oyama, Japan

Yoshifumi Ueno