Mitsubishi Denki Kabushiki Kaisha

Yoshifumi Matsushita

Tadao Minagawa

Hajime Nakatani

Toshihiro Suzuki

Atsushi Sugitatsu

Nobuyuki Zumoto

Haruhiko Nagai

Kenyu Haruta

Toshinori Yagi

Yoshihiko Yamamoto

Masao Izumo

Yasushi Minamitani

Takeo Yoshioka

Ichiro Yamasaki

Taketoshi Takemura

Takashi Eura

Shungo Tsuboi

An optical processing apparatus for processing optically a workpiece (7) by using a light beam (B). The apparatus is capable of automatically adjusting a imaging magnification to a predetermined value and at the same time maintaining constant a imaging magnification regardless of exchange of masks (3; 100) and workpieces (7) and for ensuring an extended use life of a mask with satisfactory mask function. The apparatus includes a light source system (1) for generating a light beam (B) for illuminating a mask (3; 100) having a predetermined pattern, a imaging lens (5) for copying a pattern image of the mask (3; 100) onto a workpiece (7), a mask moving mechanism (4) for moving the mask in a direction perpendicular to an optical axis (L) of the imaging lens (5), a workpiece moving mechanism for moving the workpiece in a direction perpendicular to the optical axis (L) of the imaging lens (5), a imaging magnification changing mechanism for changing inter-mask/lens/workpiece distance between the mask, the imaging lens and the workpiece, and a central control unit (9) which is comprised of an actual imaging magnification arithmetic module (91) for determining an actual imaging magnification value (M') in terms of a ratio between the copied pattern image and a predetermined pattern, a magnification decision module (92) for making decision whether or not a difference between the actual imaging magnification value and a desired imaging magnification value is smaller than a permissible value, an optical-axis displacement control module (93) responsive to indication that the difference exceeds a permissible value (.delta.) to thereby arithmetically determine on the basis of the actual and desired imaging magnification values the inter-mask/lens/workpiece distance at which the actual imaging magnification value (M') becomes equal to the desired imaging magnification value (M) for controlling thereby the imaging magnification changing mechanism so that the inter-mask/lens/workpiece distance coincides with the arithmetically determined distance, and a displacement control module for controlling the mask moving mechanism and the workpiece moving mechanism.

Optical processing method and apparatus for carrying out the same

At least the opposing surface portions of the main electrodes of an excimer laser device are covered with materials which are resistive to chemical etching than nickel. The etching resistive material may be a platinum based alloy containing rhodium, ruthenium, iridium, or osmium; a nickel based alloy containing gold, platinum, rhodium, ruthenium, iridium, or osmium; or rhodium, ruthenium, iridium, or osmium. Thus, an excimer laser device is realized by which the lives of the electrodes and the laser gas are prolonged.

Excimer laser device

An element for detecting internal faults in an insulating gas charged electrical apparatus comprises a substrate disposed in the electrical apparatus charged with an insulating gas, a pair of electrodes disposed on the substrate, and a thin metal film covering the pair of electrodes and the exposed surface of the substrate. This film is capable of producing fluorides with low conductivity upon reacting with a decomposed gas produced by internal faults of the electrical apparatus. Since the thin metal film exhibits high response characteristics readily in reaction with even a trace amount of a decomposed gas, it is possible to promptly detect faults occurring in the electrical apparatus, such as a partial discharge or local heating. In addition, a device for detecting internal faults in an insulating gas charge electrical apparatus using the internal fault detection element utilizes an optical signal for transmitting signals. Accordingly, the device is free from electromagnetically induced interference and is capable of remote monitoring because of the low level of loss in signal transmission.

Element and device for detecting internal faults in an insulating gas

Growing community of inventors

Amagasaki, Japan

Yoshifumi Matsushita