Nippon Sheet Glass Company, Limited

Yoshifumi Kijima

Toshiaki Anzaki

Kenji Mori

Etsuo Ogino

Kazuhiro Doushita

Hiroyuki Inomata

Tetsuro Kawahara

Daisuke Arai

Tetsuo Minaai

Hiroaki Tada

Daisuke Inaoka

The reduced pressure double glazed glass panel of the present invention includes an outside glass sheet, an inside glass sheet, and a gap portion that are joined together, with the gap portion being formed between the glass sheets and sealed under reduced pressure. Here, the outside glass sheet has a first glass surface disposed to face the outdoor space and a second glass surface disposed to face the gap portion. A Low-E film is formed on the second glass surface. The following relations hold: (Emissivity of Low-E film &#x2208;)&#x2266;0.067; 31%&#x2266;(Solar reflectance on First glass surface R)&#x2266;40%; (48&#x2212;R)%&#x2266;(Solar absorptance on First glass surface A)&#x2266;17%; (A)&#x2266;{18.3&#x2212;(0.07&#xd7;R)+(20&#xd7;&#x2208;)}%; (Solar heat gain coefficient SHGC)&#x2266;0.50; and (Thermal transmittance U value)&#x2266;1.2 W/m&#xb7;K or less. According to the present invention, it is possible to provide a reduced pressure double glazed glass panel having sufficient heat insulating and heat shielding properties and being less susceptible to bending when exposed to solar radiation.

Reduced pressure double glazed glass panel

A photocatalyst layer (TiO) is formed on the surface of a substrate (glass plate) through the intermediary of a monoclinic undercoat layer (ZrO), and no dead layer is substantially present between the photocatalyst layer and the undercoat layer. Also, by providing a peel preventing layer between the substrate and the undercoat layer, it is possible to eliminate film peeling between the photocatalyst layer and the substrate, defects and discoloration. A metal element may be doped in the photocatalyst layer, and it is preferable that the metal element is at least one of Sn, Zn, Mo and Fe. The phrase 'no dead layer is substantially present' means that the thickness of the dead layer is 20 nm or less. The thickness of the photocatalyst layer is preferably from 1 nm to 1,000 nm, more preferably from 1 nm to 500 nm.

Member having photocatalytic function and method for manufacture thereof

A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

Article having photocatalytic activity

The sheet resistance of titanium oxide film can be controlled in 10 to 10 &OHgr;/&square; by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under and oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.

Substrate with photocatalytic film and method for producing the same

This invention relates to an article having a substrate with a photocatalyst coating film formed thereon by ae sputtering method, characterized in that the photocatalyst coating film comprises titanium oxide as a main component and at least one kind of metal having a sputtering rate for Ar being 0.9 to 2.7 times that of Ti, preferably at least one kind of metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr, in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed by a method using a Ti metal sputtering target or a Ti sub-oxide sputtering target containing the metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two kinds of targets for two sputtering cathodes and applying reversing potential so as to have a cathode and an anode alternately.

Article coated with photocatalyst film, method for preparing the article and sputtering target for use in coating with the film

A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 &OHgr;/&square; or lower and the sputtering is conducted while heating the substrate at 230&deg; C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350&deg; C. or higher and that the deposited film does not have high photocatalytic activity.

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Osaka, Japan

Yoshifumi Kijima