Gigaphoton Inc.

Yoshiaki Kurosawa

Takashi Suganuma

Yoshifumi Ueno

Toru Suzuki

Takayuki Yabu

Hideo Hoshino

Tsukasa Hori

Yasufumi Kawasuji

Akihiro Takayama

A laser apparatus according to an aspect of the present disclosure includes: a master oscillator; at least one amplifier disposed on an optical path of a first pulse laser beam output from the master oscillator; a sensor disposed on an optical path of a second pulse laser beam output from the at least one amplifier; and a laser controller. The laser controller causes the laser apparatus to perform burst oscillation based on a burst signal from an external device, and performs processing of controlling a beam parameter based on a sensor output signal obtained from the sensor in a burst duration, and processing of detecting self-oscillation light from the amplifier based on a sensor output signal obtained from the sensor in a burst stop duration.

Laser apparatus and extreme ultraviolet light generation system

A laser apparatus includes: a plurality of envelope blocks each provided with an optical element and a first temperature sensor and covering part of a laser beam path, the optical element being disposed on the laser beam path, the first temperature sensor being configured to measure a first temperature of gas at a position away from the optical element; an envelope body including the envelope blocks and covering the laser beam path; and a control unit connected with each first temperature sensor and configured to specify an envelope block at which increase of the first temperature is measured in the envelope body as an envelope block at which anomaly is occurring.

Laser apparatus and EUV light generation system

The laser apparatus includes a master oscillator, an amplifier, a power source, and a controller to control the power source. The controller controls the power source such that an excitation intensity of the amplifier in a burst oscillation period performing the burst oscillation is a first excitation intensity, controls the power source such that, if the predetermined repetition frequency is a first repetition frequency, an excitation intensity of the amplifier in a suspension period suspending the burst oscillation is a second excitation intensity equal to or lower than the first excitation intensity, and controls the power source such that, if the predetermined repetition frequency is a second repetition frequency higher than the first repetition frequency, the excitation intensity of the amplifier in the suspension period is a third excitation intensity lower than the second excitation intensity.

Laser apparatus and extreme ultraviolet light generating system

A laser apparatus according to one aspect of the present disclosure includes a master oscillator configured to output laser light, a plurality of amplifiers each configured to include carbon dioxide as a laser medium and amplify the laser light, a first optical path pipe configured to cover a laser optical path between the amplifiers, a gas supply port configured to supply, into the first optical path pipe, gas having lower carbon dioxide concentration than that of the air, a first carbon dioxide densitometer configured to measure carbon dioxide concentration in the first optical path pipe, and an alarm device configured to issue an alarm when the carbon dioxide concentration measured by the first carbon dioxide densitometer exceeds a preset prescribed value.

A beam dump apparatus may include: an attenuator module; a beam dump module; and a control unit. The attenuator module includes: a first beam splitter provided inclined with respect to the optical axis of a laser beam at a first angle; a second beam splitter provided inclined with respect to the optical axis at a second angle; a first beam dumper provided such that the laser beam from the first beam splitter enters thereinto; a second beam dumper provided such that the laser beam from the second beam splitter enters thereinto; and a first stage that causes the beam splitters to advance into and retreat from the optical path. The beam dump module includes: a mirror; a third beam dumper provided such that the laser beam from the mirror enters thereinto; and a second stage that causes the mirror to advance into and retreat from the optical path.

Beam dump apparatus, laser apparatus equipped with the beam dump apparatus, and extreme ultraviolet light generating apparatus

A beam adjusting apparatus of an extreme ultraviolet light generating apparatus may include: a first pair of mirrors constituted by a first concave mirror and a first convex mirror, provided along the optical path of the pulsed laser beam; a second pair of mirrors constituted by a second concave mirror and a second convex mirror, which are arranged in an order reversed from the order of arrangement of the first concave mirror and the first convex mirror, provided along the optical path of the pulsed laser beam downstream from the first pair of mirrors; and a moving apparatus configured to simultaneously increase or simultaneously decrease the distance between the first concave mirror and the first convex mirror and the distance between the second concave mirror and the second convex mirror.

Extreme ultraviolet light generating apparatus

A beam delivery system may include: beam adjusters configured to adjust a divergence angle of a pulse laser beam; a beam sampler configured to separate a part of the pulse laser beam outputted from a first beam adjuster provided at the most downstream among the beam adjusters to acquire a sample beam; a beam monitor configured to receive the sample beam and output a monitored diameter; and a beam delivery controller configured to control the beam adjusters based on the monitored diameter. The beam delivery controller may adjust each of beam adjusters other than the first beam adjuster selected one after another from the most upstream so that the monitored diameter at the beam monitor becomes a predetermined value specific to the beam adjuster, and adjust the first beam adjuster so that the pulse laser beam becomes focused at a position downstream of a target position.

Beam delivery system and control method therefor

A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.

An example of the disclosure is a laser apparatus including a master oscillator capable of outputting a pulse laser beam, a plurality of optical amplifiers disposed on an optical path of the pulse laser beam outputted from the master oscillator and configured to sequentially amplify the pulse laser beam, an optical reflector capable of passing the pulse laser beam therethrough and reflecting a self-oscillation beam generated in one of the plurality of optical amplifiers, and an optical absorber capable of receiving and absorbing the self-oscillation beam reflected by the optical reflector.

An example laser apparatus of the disclosure may include an oscillator capable of outputting a laser beam, a slab optical amplifier capable of amplifying the laser beam outputted by the oscillator by passing the laser beam through an optical amplification region shaped like a slab and outputting the amplified laser beam, and a mirror disposed on an optical path of the laser beam to enter the slab optical amplifier or the amplified laser beam outputted from the slab optical amplifier, the mirror being movable in a direction parallel to a plane where the laser beam travels in the slab optical amplifier.

Growing community of inventors

Oyama, Japan

Yoshiaki Kurosawa