Korea Advanced Institute of Science and Technology

Yoon-Kee Kim

Jai-Young Lee

Young-Soo Han

Yoon-Jung Yong

The present invention relates to a CVD apparatus for highly textured diamond film formation and a method for forming a highly textured diamond film on the surface of a silicone substrate by generating a high density plasma so that each diamond film grain can have the same orientation as the substrate. The present inventors developed an improved chemical vapor deposition apparatus and a method for highly textured diamond film formation, on the ground that the nucleation density having a heteroepitaxy relation with a silicone substrate can be increased by modifying the substrate support and by generating a high density plasma right on the substrate while subjecting the whole substrate to the plasma. In accordance with the present invention, a diamond film which is close to a single crystal and has a heteroepitaxy relation with the crystalline orientation of a substrate can be formed in a simple manner.

Chemical vapor deposition method and apparatus for highly textured

The present invention provides a novel surface acoustic wave (SAW) filter having a high propagation velocity and electromechanical coupling coefficient (k.sup.2) employing A1N/A1N:H/A1N tri-layered film where both sides of A1N:H film are deposited with A1N film to protect the film from vapor, and a process for fabricating the same.

Growing community of inventors

Taejon, South Korea

Yoon-Kee Kim