Semes Co., Ltd.

Yoon-Jong Ju

Kihoon Choi

Seong Soo Lee

Seong-Soo Kim

Jong Han Kim

In-Il Jung

Yu Hwan Kim

Edwin Lee

The inventive concepts provide an apparatus for treating a substrate. The apparatus includes a housing proving an inner space in which a substrate is treated, a spin head supporting and rotating the substrate in the housing, an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head, and a controller controlling the first nozzle member. The first nozzle member includes a body, a vibrator, a pump, and a power source.

Substrate treating apparatus and method

Disclosed is an apparatus and method for treating a substrate. The method includes supplying cleaning particles to the substrate to clean the substrate. The cleaning particles are solid particles. The solid particles provide a shock wave to the substrate.

Method for treating a substrate with a shock wave

Growing community of inventors

Chungcheongnam-do, South Korea

Yoon-Jong Ju