Beijing Baidu Netcom Science Technology Co., Ltd

The Ncs Testing Technology Co., Ltd.

Yongqing Wang

Hui Wang

Haizhou Wang

Xuejing Shen

Xing Yu

Weihao Wan

Xiaojia Li

Yuhua Lu

YiFei Zhu

Qun Ren

Zhenzhen Wan

An apparatus and a method for preparing glow discharge sputtering samples for materials microscopic characterization are provided. The apparatus includes a glow discharge sputtering unit, a glow discharge power supply, a gas circuit automatic control unit, a spectrometer, and a computer. The structure of the glow discharge sputtering unit is optimized to be more suitable for sample preparation by simulation. By adding a magnetic field to the glow discharge plasma, uniform sample sputtering is realized within a large size range of the sample surface. The spectrometer monitors multi-element signal in a depth direction of the sample sputtering, so that precise preparation of different layer microstructures is realized. In conjunction with the acquisition of the sample position marks and the precise spatial coordinates (x, y, z) information, the correspondence between the surface space coordinates and the microstructure of the sample is conveniently realized.

Apparatus and method for preparing glow discharge sputtering samples for material microscopic characterization

A method of determining a state of a target object, an electronic device, and a storage medium, relate to fields of a computer technology, cloud computing and Internet of things, and apply to smart cities. The method includes: receiving a transmitted first moving point sequence for the target object, the first moving point sequence including a plurality of target moving point elements, and each target moving point element containing a timestamp information and a displacement information that indicate a stay state of the target object; determining, from the first moving point sequence, a target stay point of the target object, according to the timestamp information and the displacement information; and determining that the state of the target object at the target stay point is an abnormal stay state, in response to a distance between the target stay point and a first preset position being less than a first preset threshold.

Method of determining state of target object, electronic device, and storage medium

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Beijing, China

Yongqing Wang