Lg Chem, Ltd

Yongmi Kim

Ji Hye Kim

Min Young Lim

Minyoung Lim

Eun Seok Park

Junhyun An

Sumin Park

Yongsik Ahn

The present application relates to a compound of Formula 1, a binder resin, a negative-type photosensitive resin composition, and a display device comprising a black bank formed using same.

Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same

A chemically amplified photoresist composition comprising a triazole-based plasticizer and an alkali developable resin, which is capable of minimizing cracking of a photoresist obtained from the composition and improving adhesion to a substrate and sensitivity, and a photoresist film comprising a cured product of the chemically amplified photoresists composition.

Chemically amplified photoresist composition and photoresist film using the same

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin and a polymeric photo-acid generator having a predetermined structure, a photoresist pattern produced from the chemically amplified photoresist composition, and a method for preparing the chemically amplified photoresist pattern.

Chemically amplified photoresist composition, photoresist pattern, and method for preparing photoresist pattern

A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.

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Daejeon, South Korea

Yongmi Kim