Jsr Corporation

Symyx Technologies, Inc.

Basf Mobile Emissions Catalysts LLC

Yong Wang

Isao Nishimura

Dominique Charmot

Kenji Okamoto

Adam Luke Safir

Tsutomu Shimokawa

Han-Ting Chang

Kouji Tamori

Didier G Benoit

Eiji Yoneda

Takayoshi Abe

Masaki Momiyama

Eiichi Kobayashi

Satoshi Ebata

Masaaki Miyaji

Yusuke Okano

Yukio Nishimura

Shin-ichiro Iwanaga

Yoshihisa Ohta

Takahiro Kawai

Tetsuo Fukuta

Hiroshi Kawai

Satoshi Hyugaji

Takashi Miyamatsu

Ulrich Mueller

Hiroshi Ikeda

Andrei-Nicolae Parvulescu

Tomoki Nagai

Xinhe Bao

Hiroaki Nemoto

Atsushi Kumano

Takayoshi Tanabe

Xiulian Pan

Weiping Zhang

Haruo Iwasawa

Toshiyuki Kai

Xiangju Meng

Tatsuya Toneri

Toshiyuki Yokoi

Jun Numata

Bernd Marler

Akimasa Soyano

Kouichi Fujiwara

Ute Kolb

Tomonori Shiotani

Shigeo Shimizu

Trees De Baerdemaeker

Shirou Kusumoto

Chuan Shi

Kazuhiro Ikkyu

Yuusuke Okano

Hirokazu Niwata

Yasuaki Mutsuga

Ken-ichi Yokoyama

Yasar Krysiak

Dirk De Vos

A process for the production of a zeolitic material comprising one or more zeolite intergrowth phases of one or more zeolites having a CHA-type framework structure comprising SiOand XO, and one or more zeolites having an AFT-type framework tructure comprising SiOand XO, wherein X is a trivalent element, and wherein said process comprises: (1) preparing a mixture comprising one or more sources for SiO, one or more sources for XO, and seed crystals comprising a zeolitic material, said zeolitic material comprising SiOand XOin its framework structure and having a CHA-type framework structure; (2) heating the mixture prepared in (1) for obtaining a zeolitic material comprising one or more zeolite intergrowth phases; and (R) subjecting the zeolitic material obtained in (2) to a procedure for removing at least a portion of X from the framework structure of the zeolitic material.

Process for the production of the CHA-AFT zeolite intergrowth COE-10 and use thereof in heterogeneous catalysis

A radiation-sensitive resin composition comprising an acid-labile group-containing resin obtained by living radical polymerization having a specific structure which is insoluble or scarcely soluble in alkali, but becomes alkali soluble by the action of an acid, and a photoacid generator, wherein the ratio of weight average molecular weight to number average molecular weight (weight average molecular weight/number average molecular weight) of the acid-labile group-containing resin is smaller than 1.5.

Radiation-sensitive resin composition

Provided is a filler for affinity chromatography having a high dynamic binding capacity for proteins and having excellent alkali resistance and storage stability. The filler for affinity chromatography of the present invention comprises a porous particle consisting of a copolymer of 40 parts to 99.5 parts by mass of (M-1) a methacryloyl group-containing vinyl monomer that contains a hydroxyl group and does not contain an epoxy group, 0.5 parts to 30 parts by mass of (M-2) an epoxy group-containing vinyl monomer, 0 parts to 59.5 parts by mass of (M-3) a methacryloyl group-containing vinyl monomer which is other than the monomers (M-1) and (M-2), and 0 parts to 25 parts by mass of (M-4) a vinyl monomer other than the monomers (M-1), (M-2) and (M-3) (with the proviso that the total amount of the contents of (M-1), (M-2), (M-3) and (M-4) is 100 parts by mass); ring-opened epoxy group obtainable by ring-opening of epoxy group that is contained in the copolymer; and ligand that is bound to the porous particle.

Filler for affinity chromatography

Provided is a filler for affinity chromatography which is useful for protein purification and contains porous particles that have a high dynamic binding capacity for proteins and excellent pressure characteristics. The filler for affinity chromatography of the present invention is characterized in that it includes a porous particle consisting of a polymer of vinyl monomer including a cross-linkable vinyl monomer that contains hydroxyl group but does not contain epoxy group and an epoxy group-containing non-cross-linkable vinyl monomer, or a cross-linkable vinyl monomer that contains hydroxyl group and epoxy group, ligands bound to the porous particle, and ring-opened epoxy groups.

Provided are a filler for affinity chromatography which has excellent alkali resistance, and a method for isolating immunoglobulin. The filler for affinity chromatography is a filler in which a protein represented by the following formula (1) is immobilized on a carrier.R&#x2014;R&#x2003;&#x2003;(1) wherein R represents an amino acid sequence consisting of 4 to 300 amino acid residues containing a region consisting of 4 to 20 contiguous histidine residues; and Rrepresents an amino acid sequence capable of binding to immunoglobulin, the amino acid sequence consisting of 50 to 500 amino acid residues containing Z domain of Protein A or a fragment thereof, or a variant thereof, provided that the R binds to C-terminus or N-terminus of the R.

Filler for affinity chromatography and method for isolating immunoglobulin

An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles.

Packing material for affinity chromatography

The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein Ris a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; Rto Rare each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions

An immersion exposure liquid which exhibits a high refractive index, prevents elution and dissolution of a photoresist film or its upper layer film component, and reduces defects during formation of a resist pattern when used in an immersion exposure method, and an immersion exposure method using the immersion exposure liquid. The immersion exposure liquid is used for an immersion exposure device or an immersion exposure method in which a substrate is exposed through a liquid provided between a lens of a projection optical system and the substrate, the immersion exposure liquid being liquid in an operating temperature range of the immersion exposure device and including an alicyclic hydrocarbon compound or a cyclic hydrocarbon compound containing a silicon atom in the ring structure.

Liquid for immersion exposure and immersion exposure method

The present invention is directed to the preparation of photoresist polymers via living free radical polymerization techniques. Sterically bulky ester monomers are utilized as the polymerization components. Use of chain transfer agents is included in polymerization processing conditions. Cleavage of polymer terminal end groups that include a heteroatom are described.

Photoresist polymers

Photoresist polymer compositions

Synthesis of photoresist polymers

A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein Rrepresents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or &#x2014;ORgroup, wherein Ris a monovalent alicyclic hydrocarbon group, Rrepresents a (substituted)-alkyl group or two or more Rgroups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and Xindicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition

An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1&#x2013;10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents &#x2014;O&#x2014;SOR, &#x2014;O&#x2014;S(O)R, or &#x2014;SOR, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.

Onium salt compound and radiation-sensitive resin composition

A novel photoacid generator containing a structure of the following formula (I),wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Zand Zare individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition

Growing community of inventors

Tokyo, Japan

Yong Wang