Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Soulbrain Co., Ltd.

Techno Semichem Co., Ltd.

Yong-Sung Song

Hong-Sick Park

Byeong-Jin Lee

Tai-Hyung Rhee

Bong-Kyun Kim

Jong-Hyun Choung

Sun-Young Hong

Kui-Jong Baek

Ji-Sun Lee

Choung-Woo Park

Jong-Hyun Oh

The present invention relates to an etchant for etching metal wiring, and the metal wiring etchant according to the present invention includes hydrogen peroxide at about 5 wt % to about 15 wt %, an oxidant at about 0.5 wt % to about 5 wt %, a fluoride-based compound at about 0.1 wt % to about 1 wt %, a nitrate-based compound at about 0.5 wt % to about 5 wt %, and a boron-based compound at about 0.05 wt % to about 1 wt %.

Etchant for electrode and method of fabricating thin film transistor array panel using the same

An etchant composition that allows simplification and optimization of semiconductor manufacturing process is presented, along with a method of patterning a conductive layer using the etchant and a method of manufacturing a flat panel display using the etchant. The etchant includes nitric acid, phosphoric acid, acetic acid, and an acetate compound in addition to water.

Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same

Growing community of inventors

Daejeon, South Korea

Yong-Sung Song