Samsung Electronics Co., Ltd.

Yong Koo Lee

Jong Gun Lee

In Duk Hwang

Tae Soo Kim

Chul Ho Yun

Seock Woo Jang

Na Hui Kim

Provided are a particle measurement apparatus having a plurality of apertures arranged in series therein, and a particle measurement method using the same to statistically analyze multiple signals generated when a particle passes through the plurality of apertures, thus acquiring more accurate information on particles. The particle measurement apparatus includes a plurality of aperture members arranged in series, a plurality of electrodes to form an electric field within the plurality of aperture members, and an analyzer for statistically analyzing multiple electrical signals generated when a particle passes through the plurality of aperture members.

Particle measuring apparatus and measuring method using the same

A sample analysis apparatus configured to automatically press a start button upon installation of a sample tube is provided. The sample analysis apparatus includes: a body of the sample analysis apparatus; a door housing which may be provided in an opened state or a closed state, and configured to be coupled to the body of the sample analysis apparatus by a hinge; a tube accommodating unit included in the door housing and configured to accommodate the sample tube; a start button included in the body of the sample analysis apparatus and configured to start analysis of the sample; and an operating member positioned at a first position which is distant from the start button the sample tube is not installed in the tube accommodating unit, and a second position which is configured to operate the start button when a sample tube is installed and the door housing is closed.

Sample analysis apparatus

A microfluidic device having a chamber with a fluid discharge configuration is provided. The microfluidic device includes a platform including a chamber configured to accommodate a fluid therein. The chamber includes an inner sidewall and an outer sidewall disposed outwardly from the inner sidewall in a radial direction of the platform. The outer sidewall includes a first point located closest to a center of the platform, and a second point located farthest from the center of the platform. A distance from the center of the platform to an arbitrary third point on the outer sidewall between the first point and the second point increases from the first point to the second point, so that the fluid near the first point is guided to the second point by centrifugal force during rotation of the platform.

Growing community of inventors

Yongin-si, South Korea

Yong Koo Lee