Samsung Display Co., Ltd.

Amazon Technologies, Inc.

Liquavista B.v.

Yong Jun Park

Hyungjun Kim

Jin-Ho Ju

Jongmin Lee

Jong Soo Lee

Young Suk Lee

Jin Wook Seo

Hyun Sup Lee

Sungkyun Park

Jinho Ju

Seung Bo Shim

Sunghoon Yang

Sung-Kyun Park

Seungbo Shim

Jongsoo Lee

Young Eun Lee

Seung Cheol Ko

Hyun-Sup Lee

Seyhoon Oh

A display system according to an embodiment includes: an image projector including at least one optical member; a screen including at least one optical member; and a peripheral device. The at least one optical member of the image projector and the at least one optical member of the screen include a metamaterial member having a negative refractive index.

Display system including metamaterial member and manufacturing method of nanostructure of metamaterial member

A display device includes a light emitting area and a sub-area disposed at a side of the light emitting area, a measurement area disposed in the sub-area, measurement patterns and a first electrode extension portion being disposed in the measurement area, a first electrode and a second electrode that are disposed in the light emitting area and spaced apart from each other, and face each other, a first insulating layer disposed on the first electrode and the second electrode, at least a part of the first insulating layer being disposed on the first electrode extension portion, and at least one light emitting element having ends disposed on the first electrode and the second electrode in the light emitting area. The measurement area includes a first measurement area in which a first measurement hole exposing a part of an upper surface of the first electrode extension portion is disposed.

Display device

A method of evaluating crystallinity includes irradiating light from below a polycrystalline silicon substrate, allowing the irradiated light to pass through the polycrystalline silicon substrate and a circular polarizing plate disposed above the polycrystalline silicon substrate, measuring an intensity of light having passed through the circular polarizing plate at a location vertically above the circular polarizing plate, notifying that there is an error in a crystallinity of the polycrystalline silicon substrate when the measured intensity of the light is out of an error margin of a predetermined criterion intensity of light.

Device for evaluating crystallinity and method of evaluating crystallinity

A device for evaluating crystallinity includes a substrate holder configured to fix a polycrystalline silicon substrate thereon, a light source disposed below the substrate holder, a circular polarizing plate disposed above the polycrystalline silicon substrate, and a camera disposed above the circular polarizing plate and configured to capture an image transmitted through the circular polarizing plate.

An electrowetting display device includes a black matrix that includes a plurality of openings corresponding to pixels, respectively, a first extension portion extending in a driving direction of an electrowetting layer, the driving direction being a direction in which motion of the electrowetting layer is induced when a voltage difference is applied between a common electrode and a pixel electrode, and a partition wall that partitions the pixels. The first extension portion includes first and second areas respectively extending in opposite directions to each other and a third area having a width substantially the same as a width of the partition wall. The first area has a width less than about half of a first length corresponding to a length extending between both sides of each pixel in the driving direction, and the second area has a width less than the width of the first area.

Electrowetting display device

A device and method for measuring a critical dimension of a pattern on a display substrate is disclosed. In one aspect, the device includes a region of interest (ROI) setting unit setting a region of interest in image data, determining whether the region of interest is larger than a reference region, and generating a pattern image based on the region of interest. The device also includes a design file memory storing a plurality of design patterns, a matching unit matching the pattern image to one of design patterns, and a measurement unit measuring the critical dimension of the pattern in the pattern image. The ROI setting unit selects the image data as the pattern image and outputs the pattern image to the matching unit when the region of interest is larger than the reference region.

Device for measuring critical dimension of pattern and method thereof

An exemplary embodiment provides a liquid crystal display including: a substrate; a first wire grid polarizer; a thin film transistor; a pixel electrode; a roof layer; and a plurality of microcavities. The substrate has a bottom surface and a top surface. The first wire grid polarizer is disposed on the bottom surface of the substrate. The thin film transistor is disposed on the top surface of the substrate. The pixel electrode is connected to the thin film transistor. The roof layer is disposed to face the pixel electrode. The plurality of microcavities having injection holes are formed between the pixel electrode and the roof layer, the microcavities forming a liquid crystal layer containing liquid crystal molecules.

Liquid crystal display and method of manufacturing the same

A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.

Growing community of inventors

Yongin-si, South Korea

Yong Jun Park