Semes Co., Ltd.

Yong Joon Im

Sang Min Lee

Seung Hoon Oh

Young Hun Lee

Jin Woo Jung

Hyo Won Yang

Jin Mo Jae

Yong Hyun Choi

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing for providing a treating space for treating a substrate within; a support unit for supporting the substrate in the treating space; a bottom supply port for supplying a process fluid to the treating space; and a filler member positioned below the substrate supported on the support unit in the treating space, and wherein the filler member forms a buffer space facing the bottom supply port, and a passage is formed between the filler member and an inner wall of the housing and flows the process fluid which is introduced to the buffer space in a direction of the substrate.

Apparatus for treating substrate

A substrate processing apparatus includes a process chamber including a first body and a second body that are coupled to each other to form a processing space therein, a clamping member configured to clamp the first body and the second body, and an anti-friction member mounted in a groove formed in a contact region between the first body or the second body and the clamping member.

Substrate processing apparatus

Growing community of inventors

Yongin-si, South Korea

Yong Joon Im