Daewoo Electronics Co., Ltd.

Yong-Bae Jeon

Yong-Ki Min

Young-jun Choi

Dong-Kuk Kim

A method for the manufacturing of an array of M.times.N thin film actuated mirrors for use in an optical projection system, the inventive method includes the steps of: preparing an active matrix; depositing a passivation layer and an etchant stopping layer; depositing a thin film sacrificial layer; creating an array of M.times.N pairs of empty cavities and a continuous sacrificial area to thereby form a combination layer; forming an array of M.times.N actuated mirror structures, each of the actuated mirror structures including a first thin film electrode, a thin film electrodisplacive member, a second thin film electrode, an elastic member; and removing the thin film sacrificial layer, thereby forming the array of M.times.N thin film actuated mirrors. During the forming of the actuated mirror structures, since the iso-cut are placed above the continuous sacrificial area, even if the patterns and the iso-cuts coinside, the etchant stopping layer will not be damaged and hence during the removal of the continuous sacrificial area, the etchant will only attack the continuous sacrificial area, and the passivation layer and the active matrix located therebelow will not be affected.

Method for manufacturing a thin film actuated mirror array

An array of M.times.N electrodisplacive actuators is prepared by:

Actuator array and method for the manufacture thereof

An inventive array of thin film actuated mirrors is provided with an active matrix having an array of switching devices, an array of actuating structures and an array of mirrors, wherein each of the actuating structures is cantilevered on the active matrix, and each of the switching devices is positioned on the active matrix beside the position at which each of the actuating structures is cantilevered. In the array, during the operation of the array, since each of the mirrors is connected to the actuating structure through a recessed portion thereof, the mirror stays planar, allowing more accurate and effective reflection of the light beams, which will, in turn, enhance the overall optical efficiency of the array. Furthermore, since the active matrix has the array of switching devices is located beside each of the actuating structures, not directly therebelow, an electrical connection between each of the switching devices and the actuating structure can be made after all of the high temperature processes in the manufacture of the array have been completely, thereby minimizing the effects thereof.

Thin film actuated mirror array for use in an optical projection system

An array of M.times.N piezoelectric actuators is prepared by:

Method of manufacturing a piezoelectric actuator array

An M.times.N actuated mirror array for use in an optical projection system, comprises:

Actuated mirror array for use in optical projection system

An M.times.N actuated mirror array for use in an optical projection system, wherein M and N are integers, including: an array of M.times.N electrodisplacive actuators wherein each of the M.times.N electrodisplacive actuators is provided with a top surface, a bottom surface, a pair of external sides and has a bimorph structure having a pair of layers of an electrodisplacive material, a common signal electrode located between the pair of layers of the electrodisplacive material, and a pair of reference electrodes provided on the external sides thereof an array of M.times.N mirrors wherein each of M.times.N mirrors is coupled with each of the M.times.N electrodisplacive actuators and is mounted on the top surface of each of the M.times.N actuators an active matrix substrate comprising a substrate and an array of M.times.N second conductive type MOSFETs formed on the substrate; and an array of M.times.N connecting terminals wherein each of the M.times.N connecting terminals, located between each of the actuators and the substrate, is used for electrically connecting the common signal electrode of each of the actuators with each of the MOSFETs.

Actuated mirror array with active matrix substrate having array of

An array of M.times.N electrodisplacive actuators is prepared by: (1) forming a multilayered ceramic structure having M layers of a first conductive metallization and M+1 layers of an electrodisplacive material; (2) obtaining a composite ceramic wafer by slicing the multilayered ceramic structure in a direction normal to the layers of the first conductive metallization; (3) providing a plurality of regularly spaced horizontally directional trenches running parallel to each other wherein each of the trenches is located at an equidistance from two adjacent layers of the first conductive metallization; (4) depositing a second conductive metallization; (5) preparing N-1 regularly spaced vertically directional cuts on the composite ceramic wafer prepared using steps (3) and (4) to thereby obtain the array of M.times.N electrodisplacive actuators.

Growing community of inventors

Seoul, South Korea

Yong-Bae Jeon