Mitsubishi Chemical Corporation

Sony Corporation

Yoko Watanabe

Tomohiro Kawai

Iwao Soga

Ken Ozawa

Nobuyuki Matsuzawa

Boontarika Thunnakart

Shinji Omori

Yuko Yamaguchi

Masanori Serita

Shozo Motojima

A partition member has two surfaces in a thickness direction, and separates single cells that make up an assembled battery. When the average temperature of one of the two surfaces exceeds 180° C., a thermal resistance per unit area (θ) in the thickness direction satisfies Expression 1 below, and when the average temperatures of both of the two surfaces do not exceed 80° C., a thermal resistance per unit area (θ) in the thickness direction satisfies Expression 2 below.θ≥5.0×10(m·K/W)  (Expression 1), andθ≤4.0×10(m·K/W)  (Expression 2).

Partition member, assembled battery and method for controlling heat transfer in an assembled battery

A partition member which partitions between a pair of unit batteries or a partition member which partitions between a unit battery and a member other than the unit battery, the thermal resistances θ, θ, θ, and θof the partition member satisfy (θ/θ)/(θ/θ)≤1.0×10.

Partition member, assembled battery, and heat transfer control method of assembled battery

A partition member has two surfaces in a thickness direction, and separates single cells that make up an assembled battery. When the average temperature of one of the two surfaces exceeds 180&#xb0; C., a thermal resistance per unit area (&#x3b8;) in the thickness direction satisfies Expression 1 below, and when the average temperatures of both of the two surfaces do not exceed 80&#xb0; C., a thermal resistance per unit area (&#x3b8;) in the thickness direction satisfies Expression 2 below.

A partition member has a thickness direction and a surface direction perpendicular to the thickness direction, and which separates single cells that make up an assembled battery in the thickness direction, or a single cell that makes up the assembled battery in the thickness direction and a member other than the single cells. The partition member includes, in the interior thereof, a fluid having a boiling point at normal pressure of 80&#xb0; C. to 250&#xb0; C., and a flow channel of the fluid extending along the surface direction. The fluid is held in a fluid holding part, and the fluid holding part is hermetically sealed by a packaging material.

Partition member and assembled battery

An antireflection film wherein, even where exposure light enters obliquely in a liquid immersion lithography technique, a sufficiently reduced reflectance can be achieved at the interface between a resist layer and a silicon substrate. A two-layer antireflection film is used in exposure by an exposure system having a wavelength of 190 to 195 nm and a numerical aperture of 1.0 or less and formed between the resist layer and the silicon substrate. Where complex refractive indices Nand Nand film thicknesses of upper and lower layers of the antireflection film are represented by n-ki, n-ki and d, d, respectively, and a predetermined combination of values of [n, k, d, n, k, d] is selected, n, k, d, n, kand dsatisfy {(n-n)/(n-n)}+{(k-k)/(k-k)}+{(d-d)/(d-d)}+{(n-n)/(n-n)}+{(k-k)/(k-k)}+{(d-d)/(d-d)}&#x2266;1.

Antireflection film and exposure method

An antireflective film is provided between a resist layer and a silicon oxide layer formed on a surface of a silicon substrate, for exposure of the resist layer in an exposure system having a wavelength of 190 nm to 195 nm and a numerical aperture NA of 0.93 to 1.2. Assuming that the complex refractive indexes of upper and lower layers constituting the antireflective film are N(=n&#x2212;ki) and N(=n&#x2212;ki), respectively, and the thicknesses of both layers are dand d, when a predetermined combination of values of [n, k, d, n, k, d] is selected, n, k, d, n, k, and dsatisfy the relational expression{()/()}+{()/()}+{()/()}+{()/()}+{()/()}+{()/()}&#x2266;1.

Antireflective film and exposure method

A complementary division method able to suppress a pattern deformation by wet washing, having the steps of determining a definite division length able to suppress the pattern deformation when wet washing to a width and distance of a pattern that is assumed the pattern deformation over an elasticity limit is easiest given by wet washing in advance, dividing the entire line-and-space patterns at the determined division length in the longitudinal direction to divide suitably the line-and-space pattern by a simple algorithm, and further providing a method of producing a mask and program.

Complementary division mask, method of producing mask, and program

A granular composition consisting essentially of a granular carrier having a fused or slurried mixture comprising a pesticidally active ingredient, an antioxidant and/or an epoxy compound, and wax, coated thereon.

Growing community of inventors

Kanagawa, Japan

Yoko Watanabe