Fujifilm Corporation

Yoko Tokugawa

Akinori Shibuya

Tomoki Matsuda

Junichi Ito

Kaoru Iwato

Shuhei Yamaguchi

Toshiaki Fukuhara

Shohei Kataoka

Mitsuhiro Fujita

Naohiro Tango

Shinichi Sugiyama

Masahiro Yoshidome

According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including 

Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern

An actinic-ray- or radiation-sensitive resin composition according to the present invention includes (A) a resin to be decomposed to increase its solubility in an alkali developer when acted on by an acid, and (B) a compound represented by the general formula (1-1) below. 

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition

Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below. 

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Shizuoka, Japan

Yoko Tokugawa