Asahi Glass Company, Limited

Renesas Electronics Corporation

Yoko Takebe

Isamu Kaneko

Osamu Yokokoji

Shun-ichi Kodama

Yasuhide Kawaguchi

Shinji Okada

Naoko Shirota

Koichi Murata

Masataka Eda

Atsushi Inoue

Daisuke Shirakawa

Takeo Ishibashi

Eisuke Murotani

Takuya Hagiwara

Mamoru Terai

Miwako Ishibashi, Legal Representative

Yasuhisa Matsukawa

To provide a pellicle for lithography having a pellicle membrane excellent in light resistance against light with a wavelength of at most 250 nm, particularly at most 200 nm, a pellicle-mounted photomask using it, and an exposure treatment method. A pellicle for lithography having a multilayer pellicle membrane including a membrane made of a fluoropolymer (A) which contains, as the main component, repeating units obtained by cyclopolymerization of a pertluorodiene having one etheric oxygen atom, and a membrane made of a fluoropolymer (B) which has fluorinated alicyclic ring structures each containing, in the ring structure, two or three etheric oxygen atoms not being adjacent to one another, wherein the total thickness of the membrane made of the fluoropolymer (B) is at most 40% of the total thickness of the membrane made of the fluoropolymer (A).

Pellicle for lithography, pellicle-mounted photomask, and exposure treatment method

Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F&#x2550;CFCFC(X)(C(O)OZ)(CH)CR&#x2550;CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula &#x2014;C(O)OZ; Z is a hydrogen atom or a Cmonovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a Cmonovalent organic group.

Fluorinated compound, fluoropolymer and method for producing the compound

It is an object of the present invention to provide a water repellant composition for a substrate to be exposed which inhibits the back side of a substrate to be exposed from being contaminated by an immersion liquid, can improve adhesion between a film to be processed and an organic film directly overlying that film to inhibit film peeling, and has excellent workability, a method for forming a resist pattern, an electronic device produced by the formation method, a treatment method for imparting water repellency to a substrate to be exposed, a water repellent set for a substrate to be exposed, and a treatment method for imparting water repellency to a substrate to be exposed using the same. A water repellent composition for a substrate to be exposed including at least an organosilicon compound represented by the following general formula (1) and a solvent is used.  In the formula, Ris a monovalent organic group having 14 to 30 carbon atoms, each R, R, and Ris independently a monovalent organic group or a hydrolyzable group having 1 to 10 carbon atoms, and at least one of R, R, and Ris a hydrolyzable group.

Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same

To provide a novel polymerizable fluorocompound having a highly fluorinated norbornane structure, and a polymer obtained from the compound. Further, their production processes and a novel intermediate useful for the processes. A novel compound () such as a compound () or a compound (), and its polymer. A compound () such as a compound () or (), and a compound () such as a compound () or (), which are useful as an intermediate for the production of the compound (), and its production process. However, each of Zto Zrepresents such as &#x2014;CH(&#x2014;OC(O)C(CH)&#x2550;CH)&#x2014; or &#x2014;CF, Each of Wand Wrepresents such as F, each of Yto Yrepresents such as &#x2014;CH(&#x2014;OH)&#x2014; or &#x2014;CF(CHOH), and each of Xto Xrepresents such as &#x2014;C(O)&#x2014; or &#x2014;CF&#x2014;. 

Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processes

To provide a novel fluorinated compound, a fluoropolymer and a method for producing the compound. A compound represented by the formula CF&#x2550;CFCFC(X)(C(O)OZ)(CH)CR&#x2550;CHR (wherein X is a hydrogen atom, a cyano group or a group represented by the formula &#x2014;C(O)OZ, Z is a hydrogen atom or a Cmonovalent organic group, n is 0, 1, or 2, and R is a hydrogen atom or a Cmonovalent organic group), a method for producing it, and a fluoropolymer obtained by polymerizing the compound.

To provide a fluoropolymer having functional groups and having high transparency in a wide wavelength region, and a resist composition comprising the fluoropolymer. A fluoropolymer (A) having monomer units formed by polymerization of a fluorinated diene represented by the following formula (1):CF&#x2550;CFCHCH-Q-CHCH&#x2550;CH&#x2003;&#x2003;(1)wherein Q is (CH)C(CF)OR(wherein a is an integer of from 0 to 3, Ris an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms which may have an etheric oxygen atom, an alkoxycarbonyl group having at most 6 carbon atoms, or CHR(wherein Ris an alkoxycarbonyl group having at most 6 carbon atoms)), or (CH)COOR(wherein d is 0 or 1, and Ris a hydrogen atom, or an alkyl group or a fluorinated alkyl group having at most 20 carbon atoms), a process for its production and a resist composition having the fluoropolymer (A) as a base.

Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it

A fluoropolymer having functional groups and having high transparency in a wide wavelength range is provided, and a resist composition and a composition for a resist protective film, comprising the fluoropolymer, wherein the fluoropolymer has monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (1):CF&#x2550;CFCFC(CF)(OR)&#x2014;(CH)CR&#x2550;CHR&#x2003;&#x2003;(1)

Fluorinated compound, fluoropolymer, resist composition, and composition for resist protective film

The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process for its production. The present invention provides a fluorinated diene represented by the following formula (1):CF&#x2550;CFCHCH(C(R)(R)(OH))CHCH&#x2550;CH&#x2003;&#x2003;(1)wherein each of Rand Rwhich are independent of each other, is a fluorine atom or a fluoroalkyl group having at most 5 carbon atoms.

Fluorinated compound, fluoropolymer and process for its production

A fluoropolymer (A) having units derived from monomer units formed by cyclopolymerization of at least one fluorinated diene selected from a fluorinated diene represented by the formula (1) and a fluorinated diene represented by the formula (2), and units derived from monomer units formed by cyclopolymerization of a fluorinated diene represented by the formula (3):CF&#x2550;CFCF&#x2014;C(CF)(OR)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(1)CF&#x2550;CFCH&#x2014;CH((CH)C(CF)(OR))&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(2)CF&#x2550;CFCH&#x2014;CH(COOR)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(3)wherein Rrepresents a hydrogen atom, a blocked group of a hydroxyl group capable of being converted into a hydrogen atom by an acid, or a blocked carboxyl group-containing organic group capable of being converted into a carboxyl group-containing organic group by an acid, Rrepresents a hydrocarbon group having at most 20 carbon atoms, and n represents 0 or 1.

Fluoropolymer and resist composition

To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter. A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3),CF&#x2550;CFCF&#x2014;C(CF)(R)&#x2014;CHCH&#x2550;CH&#x2003;&#x2003;(3)wherein Ris either a hydroxyl group blocked by &#x2014;CHR&#x2014;O&#x2014;Ror an organic group having the hydroxyl group, and Ris a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

Fluoropolymer

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR&#x2014;Q&#x2014;CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

To provide a fluoropolymer which has a high concentration of functional groups to provide adequate characteristics of the functional groups and which brings about no decrease of Tg. A fluoropolymer having monomer units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the formula (1):CFR&#x2550;CR-Q-CR&#x2550;CHR&#x2003;&#x2003;(1)wherein each of Rto Rwhich are independent of one another, represents a hydrogen atom, a fluorine atom, an alkyl group having at most 8 carbon atoms, or an alicyclic hydrocarbon group, and at least one of them is an alicyclic hydrocarbon group, provided that hydrogen atoms in the alkyl group or the alicyclic hydrocarbon group may be substituted by a fluorine atom, an alkyl group or a fluoroalkyl group; and Q represents a bivalent organic group having a blocked acidic group capable of developing an acidic group by an acid or a group capable of being converted into such a blocked acidic group.

The following resist composition which is excellent particularly in transparency to light beams and dry etching properties and gives a resist pattern excellent in sensitivity, resolution, evenness, heat resistance, etc., as a chemical amplification type resist, is presented. A resist composition which comprises a fluoropolymer (A) having repeating units represented by a structure formed by the cyclopolymerization of one molecule of a fluorinated diene and one molecule of a monoene, in which the monoene unit in each repeating unit has a blocked acid group capable of regenerating the acid group by the action of an acid, an acid-generating compound (B) which generates an acid upon irradiation with light, and an organic solvent (C).

Resist composition

A fluoropolymer having repeating units formed by cyclopolymerization of a functional group-containing fluorinated diene represented by the following formula:CF&#x2550;CR-Q-CR&#x2550;CH&#x2003;&#x2003;(1)wherein each of Rand Rwhich are independent of each other, is a hydrogen atom, a fluorine atom, an alkyl group having at most 3 carbon atoms, or a fluoroalkyl group having at most 3 carbon atoms, and Q is a bivalent organic group having a functional group bonded thereto, and a production method which comprises subjecting the above diene to radical polymerization. The polymer has a high Tg and a functional group concentration sufficient to exhibit the characteristics thereof.

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Kanagawa, Japan

Yoko Takebe