Otsuka Pharmaceutical Company, Limited

Otsuka Chemical Co., Ltd.

Advanced Life Science Institute, Inc.

Yoko Sakamoto

Nobuaki Ito

Kunio Oshima

Takumi Sumida

Masatoshi Chihiro

Isao Takemura

Hironobu Ishiyama

Hideki Kitagaki

Junpei Haruta

Hidetaka Hiyama

Kenji Watanabe

Kazuhiko Fujita

Hideki Kawasome

Yusuke Kato

Takashi Hayashi

Satoshi Shimizu

Takahiro Tomoyasu

Kazuaki Kakehi

Takao Taki

Yasuo Koga

Tatsuji Kimura

Hiroaki Asai

Shintaro Yagi

Fumitaka Goto

Noboru Maki

Minoru Kashimoto

Junji Takaba

Naohiro Hayashi

Masaru Nishida

Kazunari Izumi

Wakako Hirano

Atsushi Azuma

Satoru Nakazato

A low-molecular-weight polysulfated hyaluronic acid derivative useful for treatment of an allergic disease. An agent for treatment of an allergic disease selected from pollinosis, allergic rhinitis, allergic conjunctivitis, atopic dermatitis, and asthma, represented by the following general formula (IA) or (IB); wherein n represents a number of 0 to 15; R's each independently represent a hydrogen atom or an SOH group etc.

Low-molecular polysulfated hyaluronic acid derivative and medicine containing same

Thiazole compounds for inhibiting the activity of phosphodiesterase 4, the production of tumor necrosis factor alpha, and the production of interleukin 4. The compounds of the invention are represented by general formula (1): 

Thiazole compounds and their use for inhibiting phosphodiesterase 4, TNF-&#x3b1;, and IL-4

Thiazole compounds for inhibiting the activity of phosphodiesterase 4, the production of tumor necrosis factor alpha, and the production of interleukin 4. The compounds of the invention are represented by general formula (1): wherein A is any one of the following groups (i) and (ii): (i) &#x2014;CO&#x2014;B&#x2014; wherein B is a Calkylene group and (ii) &#x2014;CO&#x2014;Ba&#x2014; wherein Ba is a Calkenylene group, and include optical isomers and salts of the compounds.

Thiazole compound and use thereof

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Tokushima, Japan

Yoko Sakamoto