Nikon Corporation

Olympus Optical Company, Ltd.

Olympus Imaging Corporation

Olympus Corporation

Cyber Security Cloud, Inc.

Yoji Watanabe

Soichi Owa

Tomoharu Fujiwara

Yoichiro Okumura

Junichi Itoh

Takashi Suzuki

Naoki Yoshida

Yuji Sakamoto

Mitsunori Kubo

Masahiro Dai

Mariko Otagiri

Wataru Hashimoto

Hirokazu Nozaki

Yusuke Kuwa

Osamu Nonaka

Kimihiko Nishioka

Keiji Kunishige

Atsushi Maruyama

Yasuo Asakura

Kazunori Mizokami

Tamotsu Koiwai

Tsuyoshi Yaji

Tatsuya Sato

Yusuke Sasaki

Haruyuki Ishihara

Kazuo Mikami

Tsugumoto Kosugiyama

Takeshi Nakane

Yasushi Toizumi

Tetsuya Kokufu

Ayumu Midorikawa

Koji Nomura

Mitsuo Goto

An exposure apparatus includes: a substrate stage onto which a substrate is to be mounted; an exposure unit radiating an exposure light toward the draw-out electrode on at least one semiconductor chip; a pattern determination unit determining an exposure pattern; and a controller controlling the substrate stage and the exposure unit. The pattern determination unit determines a pattern of a relay wiring connecting the draw-out electrode and a predetermined position with respect to the substrate, by using an output from a measurement unit to measure a position of the semiconductor chips on the substrate to obtain a positional deviation. The controller exposes the relay wiring pattern onto an exposure area extending, on the photosensitive layer, in the uniaxial direction by the exposure unit, while moving the substrate from a first-side in the uniaxial direction to a second-side opposite to the first-side in the uniaxial direction by the substrate stage.

Exposure apparatus, exposure method, device manufacturing method, and device

A diagnostic system, method, and a computer-readable storage medium for determining a severity of a gastric condition, such as gastritis, in a subject are disclosed. The diagnostic system includes a processor that obtains an image of a stomach of the subject collected by an endoscope. The processor can compare the subject image with reference normal and abnormal stomach images. If the subject image is abnormal, the processor can generate a subject abnormality image indicative of the differences between the subject image and the normal image. By comparing the generated subject abnormality image with reference abnormality images representative of different severity levels of gastritis, the processor can diagnose the subject as having a particular severity level of gastritis.

System and method for diagnosing severity of gastritis

In a drive method for a spatial light modulator, out of a first boundary region and a second boundary region arranged adjacently in a Y-direction and extending in an X-direction, mirror elements arranged at a first pitch not resolved by a projection optical system, in the X-direction in the first boundary region are set in the phase 0, and the other mirror elements therein are set in the phase &#x3c0;; mirror elements arranged at a second pitch not resolved by the projection optical system, in the X-direction in the second boundary region are set in the phase &#x3c0;, and the other mirror elements therein are set in the phase 0.

Drive method for spatial light modulator, method for generating pattern for exposure, and exposure method and apparatus

A firewall device comprises a storage unit that stores therein one or more rules related to blocking a request for each of a plurality of WEB servers independently of the rule for another WEB server; a feature-amount calculating unit that calculates a feature amount for each of the WEB servers based on a number of detections with regard to each index in each of the WEB servers; and a rule updating unit that updates a rule stored in the storage unit for each of the WEB servers based on the feature amount calculated by the feature-amount calculating unit.

Firewall device to automatically select a rule required for each individual web server

A diagnostic system, method, and a computer-readable storage medium for determining a severity of a gastric condition, such as gastric cancer, in a subject are disclosed. The diagnostic system includes a processor that can obtain various images of a stomach of the subject including wavelength images and generate difference images from the wavelength images. The processor can compare the subject images with reference images representative of different severity levels of gastric cancer, or can input the subject images into a learned model trained using the reference images stored in the database to extract a feature pattern corresponding to a severity of gastric cancer to diagnose the subject as having a particular severity level of gastric cancer.

System and method for diagnosing severity of gastric cancer

A mirror array device, and related exposure apparatus and manufacturing method, for driving a spatial light modulator that includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180&#xb0; from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

Spatial light modulator, method of driving same, and exposure method and apparatus

A spatial light modulator includes a first reflective surface which reflects incident light and is movable between a first position and a second position, the first and the second positions being located along a first axis, a second reflective surface which reflects the incident light, is arranged at a position where the second reflective surface is adjacent to the first reflective surface in a direction along a second axis crossing the first axis, and is movable between a third position and a fourth position, the third and the fourth positions being located along a direction parallel to the first axis, and a reflective part which reflects the incident light and is arranged between the first reflective surface and the second reflective surface in the direction along the second axis, wherein a distance between the first position and the reflective part, defined in the direction parallel to the first axis, is configured to attenuate light reflected at the reflective part by using light reflected at the first reflective surface, and a distance between the second position and the reflective part, defined in the direction parallel to the first axis, is configured to attenuate the light reflected at the reflective part by using the light reflected at the first reflective surface.

Spatial light modulator, exposure apparatus, and method for manufacturing device

A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180&#xb0; from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

A device manufacturing method includes forming, in a first layer, first line patterns of which longitudinal direction is a first direction; and forming, in a second layer above the first layer, second line patterns of which longitudinal direction is a second direction crossing the first direction, and third line patterns of which longitudinal direction is the second direction and having a etching characteristic different from an etching characteristic of the second line patterns. At least one edge portion of each of the second line patterns and at least one edge portion of each of the third line patterns are adjacent. As viewed from above the second layer, the adjacent at least one edge portions of one of the second and third line patterns are positioned between two adjacent line patterns of the first line pattern.

Method for forming pattern and method for producing device

A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180&#xb0; different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90&#xb0;+k&#xb7;180&#xb0;) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.

A pattern forming method which includes: forming a plurality of first line patterns of which longitudinal direction is a first direction and a plurality of second line patterns of which longitudinal direction is the first direction and of which etching characteristic is different from etching characteristic of the plurality of first line patterns, so that at least one edge portion of each of the plurality of first line patterns and at least one edge portion of each of the plurality of second line patterns are adjacent to each other; and removing at least a portion of the plurality of first line patterns by etching.

A method for driving a spatial light modulator includes setting a plurality of mirror elements in a first region into a state of phase, setting a plurality of optical elements in a second region adjacent in a Y-direction to the first region into a state of phase &#x3c0;, and setting auxiliary pattern elements consisting of a plurality of mirror elements arranged at a pitch P over a resolution limit of a projection optical system in an X-direction in a boundary region extending in the X-direction between the first region and the second region, into the state of phase &#x3c0;. In projecting a pattern onto an object with use of the spatial light modulator having the array of optical elements, the pattern can be formed in position accuracy or shape accuracy finer than the width of images of the optical elements.

Method for driving spatial light modulator, method for forming pattern for exposure, exposure method, and exposure apparatus

An imaging device of the present invention comprises an imaging section, including an image sensor for imaging a subject, for generating image data based on output signals of the image sensor; a control section for casing repeated operation of the imaging section in accordance with a single release operation; an adding processing section for sequentially adding image data repeatedly output from the imaging section and generating added mage data; an image display section for displaying the added image data; and a setting section for setting a repeat period for the imaging section and instructing to the control section. Also, an imaging device of the present invention, comprises an imaging section for repeatedly forming an image of a subject at a set period, while performing a bulb exposure operation, and outputting image data; an adding processing section for performing adding processing of the image data and previously output image data; an added image storage section for respectively independently storing a plurality of added images that have been added by the adding processing section, and a display section for displaying, in a list, the plurality of added images that have been stored in the added image storage section after completion of the bulb exposure operation.

Growing community of inventors

Fuchu, Japan

Yoji Watanabe