Kabushiki Kaisha Toshiba

Yoichiro Yabe

Takashi Nakamura

Takashi Ishigami

Koichi Watanabe

Takashi Watanabe

Michio Sato

Yukinobu Suzuki

Yasuo Kohsaka

Hitoshi Aoyama

Mitsuo Nakamura

A method of manufacturing a tungsten sputtering target includes pressing a high purity tungsten powder to form a pressed compact, first sintering the pressed compact at a temperature of 1450-1700&#xb0; C. for one hour or longer after the pressed compact is heated at a heating-up rate of 2-5&#xb0; C./min on the way to a maximum sintering temperature, second sintering the pressed compact to form a sintered body at a temperature of 1900&#xb0; C. or higher for 5 hours or longer, working the sintered body to obtain a shape of a target, subjecting the target to a grinding work of at least one of rotary grinding and polishing, and subjecting the target to a finishing work of at least one of etching and reverse sputtering.

Tungsten sputtering target and method of manufacturing the target

A component for a vacuum deposition apparatus comprises a component body and a spray deposit formed on a surface of a component body. A spray deposit has surface roughness in which a mean spacing S of tops of local peak of profile is in the range from 50 to 150 &#x3bc;m, and distances to a bottom of profile valley line Rv and to a top of profile peak line are in the ranges from 20 to 70 &#x3bc;m, respectively. Furthermore, a spray deposit has a low hardness coat selected from an Al base spray deposit of Hv 30 (Vickers hardness) or less, a Cu base spray deposit of Hv 100 or less, a Ni base spray deposit of Hv 200 or less, a Ti base spray deposit of Hv 300 or less, a Mo base spray deposit of Hv 300 or less and a W base spray deposit of Hv 500 or less. Such component for a vacuum deposition apparatus may suppress, with stability and effectiveness, peeling of deposition material adhering on a component during deposition. In addition, the number of apparatus cleaning and of exchange of components may be largely reduced. A target comprises a similar spray deposit. A vacuum deposition apparatus is one in which above component for a vacuum deposition apparatus is applied in a holder of a sample to be deposited, a deposition material source holder, a preventive component and so on.

Components for vacuum deposition apparatus and vacuum deposition apparatus therewith, and target apparatus

An EL panel package film comprises, for example, a PCTFE film or a PET film having a moistureproof layer. This EL panel package film has irregularities of 3 &mgr;m or more in arithmetic average roughness (Ra) and 10 &mgr;m or more in maximum height (Ry) specified in JIS G 0601 on at least one of its surfaces. The EL panel is configured by using the EL panel package film having such surface irregularities as a package film on at least a light emitting surface side. Oscillations produced due to the polarity inversion of an alternate voltage applied to the EL panel are absorbed and dispersed by the irregularities formed on the package film surface. A LCD module has such an EL panel as the backlight. Noise from the LCD cell surface is reduced.

Package film for EL panel, its manufacture, and EL panel and LCD module employing the film

Growing community of inventors

Kanagawa, Japan

Yoichiro Yabe