Sumitomo Electric Industries, Limited

Agency of Industrial Science and Technology

Kozo Iizuka, Director General, Agency of Industrial Science and

Yoichi Yamaguchi

Jun Shioya

Akira Mizoguchi

Kenichi Takahashi

Noriyuki Yoshida

Satoshi Takano

Noriki Hayashi

Kenji Miyazaki

Yoshinobu Ueba

Hironaga Matsubara

A method of forming a superconducting circuit comprises the steps of preparing a ceramics body which is changed from a non-superconductive phase not superconducting at the working temperature into a superconducting phase superconducting at the working temperature by heat treatment and performing the heat treatment on a part of the ceramics body by applying a laser beam to the ceramics body to change the same into the superconductive phase, thereby to form a superconducting circuit consisting of the superconductive phase and the non-superconductive phase on the ceramics body.

Method of forming superconducting circuit

A thin film of an oxide superconductor having a homogeneous composition and less oxygen defects is produced by independently vaporizing at least one material selected from the group consisting of the elements of Ia, IIa and IIIa groups of the periodic table and their compounds and at least one material selected from the group consisting of the elements of Ib, IIb and IIIb groups of the periodic table and their compounds in the presence of molecular oxygen and depositing the vaporized materials together with oxygen on a substrate to form a thin film of the oxide superconductor.

Method for producing thin film of oxide superconductor

A thin film of an oxide superconductor having a homogeneous composition and less oxygen defects is produced by independently vaporizing onto a substrate at least one material selected from the group consisting of the elements of Ia, IIa and IIIa groups of the periodic table and their compounds and one material selected from the group consisting of Cu and its compounds and irradiating the substrate with oxygen ions and depositing the vaporized materials together with oxygen on the substrate to form the thin film of the oxide superconductor.

A carbon film having a larger electrical conductivity is produced on a substrate by an ion beam method comprising steps of ionizing an organic compound having at least one substituent selected from the group consisting of a carbonyl group, an aldehyde group, an acyl group, an acid anhydride group, an amino group, a nitro group, a hydroxyl group, an alkoxyl group, a thiol group and a halogen or a cluster of said organic compound with an ion beam which accelerates ionized species towards a substrate by an electric field and forming a carbon film on the substrate.

Method for producing electrically conductive carbon film

A carbon film having a large electrical conductivity is produced at a comparatively low substrate temperature by a method comprising forming the carbon film from a hydrocarbon by an ion beam method and heating the substrate at a temperature of 400.degree. C. to 1,200.degree. C.

Cluster ion plating method for producing electrically conductive carbon

A method for forming a conductive graphite film comprises the steps of forming a carbon film on substrate material heated to 700.degree. C. or higher through a plasma discharge using hydrocarbon gas as raw material and subjecting the film to heat treatment at temperatures exceeding 1,500.degree. C.

Growing community of inventors

Osaka, Japan

Yoichi Yamaguchi