Sony Corporation

Yoichi Tomo

Keisuke Matsuo

Masao Saito

Tadashi Ishibashi

Tetsuo Nakayama

Nobuo Ozawa

Eisuke Matsuda

Takanori Shibasaki

Yasunori Kijima

Toshihiro Fukuda

Yuichi Iwase

Hidetoshi Watanabe

Shigeyuki Matsunami

Tetsuo Urabe

Koichi Tsukihara

Tetsuo Shibanuma

Takashi Kasuga

A display unit which the view angle is limited and the front luminance is improved is provided. The display unit includes a display device, and a light guiding part which is provided to face the display device, has an incident face on the side opposing to the display device, an emitting face on the opposite side of the display device, and a reflective face on the side face, and has a cross section expanding from the incident face to the emitting face.

Display unit

A display device and a method for manufacturing the display device are provided. The display device includes an organic layer on an auxiliary wiring is removed with high precision by one operation and, thereby, the yield and the productivity are improved. A lower electrode is formed by patterning in each pixel on a substrate. An auxiliary wiring including a light absorption layer is formed between individual pixels. An organic layer is formed on the substrate while covering the lower electrodes. Laser irradiation is conducted from the organic layer side, the laser light is converted to heat in the light absorption layer exposed at a portion under the organic layer, and the organic layer portion above the light absorption layer is removed selectively. An upper electrode is formed on the organic layer and is connected to the light absorption layer portion of the auxiliary wiring.

Display device and method for manufacturing display device

In a stacked display device with light-emitting units composed of organic layers and stacked together, the use of a stable material in at least a portion of a charge generation layer makes it possible to achieve improvements in environmental stability and also to attain an improvement in the efficiency of injection of charges from the charge generation layer into the light-emitting units. The display device can be readily fabricated. In a display device () provided with a plurality of light-emitting units (-)(-), each of which includes at least an organic light-emitting layer (), stacked together between a cathode () and an anode (), and also with a charge generation layer () held between the respective light-emitting units (-)(-), at least a portion of the charge generation layer () is composed of an oxide or fluoride which contains at least one of alkali metals and alkaline earth metals.

Display device

A photosensitive composition is provided which prevents deactivation of photosensitive compounds contained therein to provide accurate photoresist pattern shapes. The photosensitive compositions include a photosensitive acid generator, a polyhydroxy-functional resin component and an aliphatic amine. In a preferred embodiment, the photosensitive compositions also may include a bridging agent. The photosensitive compositions preferably contain the aliphatic amine(s) in an amount of from about 0.01% to about 1.0% by weight, based upon the weight of the overall photosensitive composition.

Photosensitive composition containing an aliphaticamine

A contact hole forming method uses a negative resist film having an absorptivity of 0.5 .mu.m.sup.-1 or above to suppress standing-wave effect in forming contact holes in a silicon dioxide film or the like underlying the negative resist film by anisotropic etching. The contact hole forming method comprises steps of: applying a negative resist having an absorptivity of 0.5 .mu.m.sup.-1 or above to the stepped surface of a stepped film formed on a substrate to form a negative resist film having a flat surface; exposing the negative resist film through a photomask to laser light emitted by a krypton fluoride excimer laser; developing the exposed negative resist film; and etching the silicon dioxide film or the like by anisotropic etching using the developed negative resist film as an etching mask and an etching gas containing a fluorocarbon or a mixture of a fluorocarbon and hydrogen to form contact holes. The negative resist film suppresses standing-wave effect, so that the contact holes can be formed in diameters accurately corresponding to the diameters of corresponding patterns of the photomask.

Contact hole forming method

An antireflective layer comprises a binder component in the form of a rosin which is soluble in both a low polar organic solvent and an aqueous alkaline solution, and a light absorbing component which is also soluble in both the low polar organic solvent and the aqueous alkaline solution. In photolithography, the antireflective layer exhibits excellent anti-reflective properties in a predetermine UV wavelength region, and, when used for forming resist patterns, the antireflective layer can be applied dissolved in the low polar organic solvent in a manner which has no detrimental effect on the resist, and can be removed along with the resist during the development process using the aqueous alkaline solution.

Method of forming resist pattern utilizing antireflective layer

A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photoresist composition is also provided. The photoresist composition (1) includes a substance containing a skeleton as at least a part of the main chain. The skeleton is obtained through polymerization of a vinyl alcohol-type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by protective groups capable of being released by an acid. The skeleton preferably contains a group for improving the dry etching resistance. The photoresistive composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development and a negative pattern is obtained by alcohol development.

Method for making a dry etching resistant positive and negative

A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photo-resistive composition is also provided. The photoresist composition includes a substance containing a skeleton as at least a part of a main chain. The skeleton is obtained through polymerization of a vinyl alcohol type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by acid-releasing protective groups. The skeleton preferably contains a group for improving the dry etching resistance. The photoresist composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development, and a negative pattern is obtained by alcohol development.

Polyvinyl alcohol-based photoresist

A method for producing a planar type electron radiating device including a plurality of cathodes having pointed ends on a major surface of a substrate, and a gate electrode having holes in the vicinity of the cathodes, is disclosed. After a hole is formed in the gate electrode and a silicon oxide film for laying a part of the major surface of the substrate to outside, a chromium thin film as a tight metal bonding film is deposited on the bottom of the hole prior to formation of the cathode, and the cathode is formed on the chromium thin film to prevent the cathode from being detached during the production process.

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Kanagawa, Japan

Yoichi Tomo