Hitachi, Ltd.

Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Yoichi Ose

Hideo Todokoro

Makoto Ezumi

Mitsugu Sato

Noriaki Arai

Takashi Ohshima

Naomasa Suzuki

Akira Ikegami

Kiyomi Yoshinari

Hiroyasu Shichi

Takahiro Sato

Toshihide Agemura

Hideo Morishita

Ritsuo Fukaya

Kazunari Asao

Tatsuaki Ishijima

Yoshiaki Kato

Yoshimi Kawanami

Takeshi Kawasaki

Katsuhiro Sasada

Takaho Yoshida

Sho Takami

Tatsuro Ide

Tsuyoshi Inanobe

Takashi Doi

Tadashi Otaka

Tomihiro Hashizume

Momoyo Enyama

Shinichi Matsubara

Shunroku Taya

Junichi Katane

Osamu Nasu

Katsuhiko Sakai

Norihide Saho

Toshiaki Kusunoki

Tadao Mimura

Osamu Yamada

Keigo Kasuya

Yuko Iwabuchi

Wataru Mori

Tomohiro Kudo

Yoshiya Higuchi

Toshiro Kubo

Katsuhiro Nakagawa

Kazuyoshi Miki

Naohiro Kohmu

Shou Takami

Hiroyuki Minemura

Hiroshi Suzuki

Yusuke Sakai

Muneyuki Fukuda

Hiroyuki Ito

Hideyuki Kazumi

Hiroyuki Tanaka

Tohru Ishitani

Yasuaki Takada

Yoshinobu Kimura

Minoru Sakairi

Yumiko Anzai

Natsuki Tsuno

Atsumu Hirabayashi

Satoru Fukuhara

Takashi Onishi

Tsunenori Nomaguchi

Tomonori Nakano

Hiroyuki Muto

Eiko Nakazawa

Takafumi Miwa

Hiroyasu Kaga

Makoto Kuwahara

Shin Imamura

Mami Konomi

Hideto Dohi

Kuniyasu Nakamura

Shunya Watanabe

Koichiro Takeuchi

Tetsuya Sawahata

Kotoko Urano

Shun-ichi Watanabe

Kenichi Hirane

Masayoshi Yano

Hironori Moritani

Masaru Moriyama

Tomonori Suzuki

Hiroki Sano

Ryuji Hoya

Ryuji Nishi

Akio Takaoka

An activation mechanism is provided in an activation region of an electron gun, and includes a light source deviceconfigured to irradiate a photocathode with excitation light, a heat generating element, an oxygen generation unit configured to generate oxygen by heating the heat generating element, and an emission current meter configured to monitor an emission current generated by electron emission when the photocathodeis irradiated with the excitation light from the light source device. In a surface activation process, the photocathode is irradiated with the excitation light from the light source device, an emission current amount of the photocathode is monitored by the emission current meter, the heat generating element is heated to generate oxygen by the oxygen generation unit, and the heating of the heat generating element is stopped when the emission current amount of the photocathode satisfies a predetermined stop criterion.

Electron beam application device

The apparatus includes: a photocathode including a substrate and a photoelectric film formed on the substrate; a light source configured to emit a pulsed excitation light; a condenser lens facing the substrate of the photocathode and configured to condense the pulsed excitation light toward the photocathode; a first anode electrode and a second anode electrode facing the photoelectric film of the photocathode; a first power supply configured to apply a first control voltage between the first anode electrode and the second anode electrode; and a second power supply configured to apply an acceleration voltage between the photocathode and the second anode electrode. The first anode electrode is disposed between the photocathode and the second anode electrode. A surface of the first anode electrode facing the second anode electrode has a recessed shape, and a surface of the second anode electrode facing the first anode electrode has a protruding shape.

Electron gun and electron beam application device

The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.

Electron gun and electron microscope

An electron beam emitted from a photoexcited electron gun is increased in luminance. An electron gunincludes: a photocathodeincluding a substrateand a photoelectric film; a light sourcethat emits pulsed excitation light; a condenser lensthat focuses the pulsed excitation light toward the photocathode; and an extractor electrodethat faces the photocathode and that accelerates an electron beam generated from the photoelectric film by focusing the pulsed excitation light by the condenser lens, transmitting the pulsed excitation light through the substrate of the photocathode, and causing the pulsed excitation light to be incident on the photocathode. The pulsed excitation light is condensed at different timings at different positions on the photoelectric film of the photocathode.

Electron gun and electron beam application apparatus

A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

Electron beam apparatus

To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathodewith negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beamgenerated from the photocathode by excitation lightirradiated through the excitation optical system onto a sample, the excitation optical system including a light source devicefor the excitation light; and an optical modulation meanswhich is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

Electron microscope

An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.

Electron source and electron beam device using the same

In order to provide a stable hexaboride single-crystal field emission electron source capable of heat-flashing, this field emission electron source is provided with a metal filament, a metal tube joined thereto, a hexaboride tip that emits electrons, and graphite sheets that are independent of the metal tube and the hexaboride tip. The hexaboride tip is arranged so as not to be in structural contact with the metal tube due to the graphite sheets. The hexaboride tip, the graphite sheets, and the metal tube are configured so as to be mechanically and electrically in contact with one another.

Field emission electron source, method for manufacturing same, and electron beam device

Provided is a charged-particle-beam device capable of simultaneously cancelling out a plurality of aberrations caused by non-uniform distribution of the opening angle and energy of a charged particle beam. The charged-particle-beam device is provided with an aberration generation lens for generating an aberration due to the charged particle beam passing off-axis, and a corrective lens for causing the trajectory of the charged particle beam to converge on the main surface of an objective lens irrespective of the energy of the charged particle beam. The main surface of the corrective lens is disposed at a crossover position at which a plurality of charged particle beams having differing opening angles converge after passing through the aberration generation lens.

Charged particle-beam device

Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.

Ion source and ion beam device using same

It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.

Charged particle beam device and arithmetic device

An electron microscope is provided with a scintillator () and a light guide (). The scintillator () has an index of refraction greater than the index of refraction of the light guide (), and an end surface () joined to the light guide () is formed from a curved surface with a convex shape on the outside. The scintillator () is formed by a Y&#x2014;Al&#x2014;O based ceramic sintered body represented by the compositional formula (LnCe)MO(wherein Ln represents at least one element selected from the group consisting of Y, Gd, La, and Lu, and M represents either or both of Al and Ga).

Electron microscope and electron beam detector

The objective of the present application is to suppress the occurrence of flares and to reduce the amount of secondary electrons arising at an aperture provided to the lead-out electrode of an electron gun. By coating a thin film having a low rate of secondary electron emission such as carbon onto the aperture of a lead-out electrode closest to an electron source in an electron gun, it is possible to reduce the amount of secondary electrons arising. Secondary electrons arising at the lead-out electrode, are reduced, and so as a result, flare is reduced. By incorporating two apertures to the lead-out electrode, and applying to the two apertures a potential that is equipotential to the lead-out electrode, it is possible to eliminate an electric field from seeping from under to over the lead-out electrode. Secondary electrons arising when an electron beam impacts the lead-out electrode cease to incur force in the direction of passage from the lead-out electrode, and consequently there is a reduction in flares.

Electron gun and charged particle beam device having an aperture with flare-suppressing coating

The electrical charging by a primary electronic is inhibited to produce a clear edge contrast from an observation specimen (i.e., a specimen to be observed), whereby the shape of the surface of a sample can be measured with high accuracy. An observation specimen in which a liquid medium comprising an ionic liquid is formed in a thin-film-like or a webbing-film-like form on a sample is used. An electron microscopy using the observation specimen comprises: a step of measuring the thickness of a liquid medium comprising an ionic liquid on a sample; a step of controlling the conditions for irradiation with a primary electron on the basis of the thickness of the liquid medium comprising the ionic liquid; and a step of irradiating the sample with the primary electron under the above-mentioned primary electron irradiation conditions to form an image of the shape of the sample.

Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen

A diffraction aberration corrector formed by the multipole of the solenoid coil ring and having a function of adjusting the degree of orthogonality or axial shift of the vector potential with respect to the beam axis. In order to cause a phase difference, the diffraction aberration corrector that induces a vector potential, which is perpendicular to the beam axis and has a symmetrical distribution within the orthogonal plane with respect to the beam axis, is provided near the objective aperture and the objective lens. A diffracted wave traveling in a state of being inclined from the beam axis passes through the ring of the magnetic flux. Since the phase difference within the beam diameter is increased by the Aharonov-Bohm effect due to the vector potential, the intensity of the electron beam on the sample is suppressed.

Device for correcting diffraction aberration of electron beam

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Mito, Japan

Yoichi Ose