Sony Corporation

Sony Semiconductor Solutions Corporation

Sony Group Corporation

Yoichi Ootsuka

Atsushi Yamamoto

Kiyotaka Tabuchi

Keiji Tatani

Tomoharu Ogita

Yoshinori Toumiya

Akiko Ogino

Tomoyuki Yamashita

Kensaku Maeda

Ippei Yoshiba

Yuichi Seki

Takahiro Kamei

Yuichi Yamamoto

Tadashi Iijima

Satoru Wakiyama

Masaki Haneda

Suguru Saito

Naoki Komai

Yoshiaki Kitano

Masaya Nagata

Kaori Takimoto

Shinichiro Noudo

Taizo Takachi

Kenju Nishikido

Yuuji Nishimura

Masaya Shimoji

Toyomi Jinwaki

Kouichi Itabasi

Mitsuru Ishikawa

Yosuke Takita

Takashi Nakashikiryo

Ryou Chiba

Takafumi Nishi

Image quality of an imaging element having a configuration in which pixels having color filters are arranged two-dimensionally is prevented from being lowered. An imaging element includes a plurality of pixels and incident light attenuation sections. The pixel includes a color filter transmitting incident light having a predetermined wavelength, and a photoelectric conversion section that produces an electric charge according to the light transmitted through the color filter. The incident light attenuation section is disposed between the color filters of the adjacent pixels, is configured to be different in surface height from the color filters, and attenuates light not transmitted through the color filter but incident on the photoelectric conversion section of the pixel where the color filter is disposed.

Imaging element and imaging apparatus

The present disclosure relates to a backside illumination type solid-state imaging device, a manufacturing method for a backside illumination type solid-state imaging device, an imaging apparatus, and electronic equipment by which the manufacturing cost can be reduced. A singulated memory circuit and a singulated logic circuit are laid out in a horizontal direction and are embedded by an oxide film and flattened, and then are stacked so as to be contained in a plane direction under a solid-state imaging element. The present disclosure can be applied to an imaging apparatus.

Backside illumination type solid-state imaging device, manufacturing method for backside illumination type solid-state imaging device, imaging apparatus and electronic equipment

Provided is a semiconductor device having high planarity in an in-plane direction. This semiconductor device includes a semiconductor substrate, a first plating film pattern, a second plating film pattern, and an insulating layer. The semiconductor substrate has a first surface, and a second surface on a side opposite to the first surface. The first plating film pattern includes a first portion that covers a first regional portion of the first surface, and a second portion that is stacked to cover a portion of the first portion. The second plating film pattern includes a third portion that covers a second regional portion different from the first regional portion of the first surface, and also includes a fourth portion that is stacked to cover a portion of the third portion. A portion between the second portion and the fourth portion is filled with the insulating layer.

Semiconductor device, imaging unit, and electronic apparatus

Provided is an imaging device including a light reception section that includes a plurality of pixels each performing photoelectric conversion and a plurality of on-chip lenses that is provided on a light incident side of the light reception section at a pitch less than a length of a wavelength on a longest wavelength side of a wavelength region of light to be received by the light reception section. The imaging device further includes a transparent substrate that is provided on a light incident side of the on-chip lenses.

Imaging device and electronic apparatus for flare reduction in an on-chip lens array

The present disclosure relates to an imaging element, a fabrication method, and electronic equipment by which an image having higher picture quality can be imaged. The imaging element includes a first light absorbing film formed in an effective pixel peripheral region, the effective pixel peripheral region being provided so as to enclose an outer side of an effective pixel region in which a plurality of pixels is disposed in a matrix, so as to cover a semiconductor substrate, a microlens layer provided as an upper layer than the first light absorbing film and having a microlens formed so as to condense light for each of the pixels in the effective pixel region, and a second light absorbing film provided as an upper layer than the microlens layer and formed in the effective pixel peripheral region. The present technology can be applied, for example, to a CMOS image sensor.

Imaging element, fabrication method, and electronic equipment

There is provided an image pickup element including a non-planar layer having a non-planar light incident surface in a light receiving region, and a microlens of an inorganic material which is provided on a side of the light incident surface of the non-planar layer, and collects incident light.

Image pickup element, image pickup device, manufacturing device and method

The present disclosure relates to a solid-state imaging device, a manufacturing method thereof, and an electronic apparatus, in which both oblique light characteristics and sensitivity can be improved. The solid-state imaging device includes pixel array unit in which a plurality of pixels is two-dimensionally arranged in a matrix and multi-stage light shielding walls are provided between the pixels. The present disclosure is applicable to, for example, a back-illuminated type solid-state imaging device and the like.

Solid-state imaging device, manufacturing method thereof, and electronic apparatus

A solid-state imaging device includes: a first lens layer; and a second lens layer, wherein the second lens layer is formed at least at a periphery of each first microlens formed based on the first lens layer, and the second lens layer present at a central portion of each of the first microlenses is thinner than the second lens layer present at the periphery of the first microlens or no second lens layer is present at the central portion of each of the first microlenses.

Solid-state imaging device with layered microlenses and method for manufacturing same

A solid-state image pickup device includes: a filter section including filters that are disposed corresponding to respective pixels, and each allowing light of a color that corresponds to corresponding one of the pixels to transmit therethrough, in which the pixels are each configured to receive the light of the predetermined color; and a microlens array section including a plurality of microlenses each configured to collect the light for corresponding one of the pixels, in which the microlenses are stacked with respect to the filter section, and are arranged in an array pattern corresponding to the respective pixels. The microlenses have two or more shapes that are different from one another corresponding to the respective colors of the light to be received by the pixels, and each having an end that is in contact with the end of adjacent one of the microlenses.

Solid-state image pickup device, electronic apparatus, and manufacturing method

Provided are a solid-state image-capturing device, a semiconductor apparatus, an electronic apparatus, and a manufacturing method that enable improvement in reliability of through electrodes and increase in density of through electrodes. A common opening portion is formed including a through electrode formation region that is a region in which the plurality of through electrodes electrically connected respectively to a plurality of electrode pads provided on a joint surface side from a device formation surface of a semiconductor substrate is formed. A plurality of through portions is formed so as to penetrate to the plurality of respective electrode pads in the common opening portion, and wiring is formed along the common opening portion and the through portions from the electrode pads to the device formation surface corresponding to the respective through electrodes. The present technology can be applied to a layer-type solid-state image-capturing device, for example.

Solid-state image-capturing device, semiconductor apparatus, electronic apparatus, and manufacturing method

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Kumamoto, Japan

Yoichi Ootsuka