Showa Denko K.k.

Yoichi Namba

Hiroshi Takahashi

Fumio Matsui

Yuichi Kamijo

Tsutomu Masuko

Takahiko Motoyama

Yoshio Miyata

Noritoshi Kamoi

Yukari Ohwaki

Shigeru Murakami

A resist resin comprising a copolymer in which a (meth)acrylic structure having a side chain group decomposable with an acid and a polyorganosilsesquioxane structure represented by formula (1) are present in one molecule or a mixture of polymers in which these structures are each present in different molecules as well as a method of forming a pattern using the resist resin:

Resist resin, resist resin composition and method of forming pattern using resist resin and resist resin composition

Disclosed is a ladder silicone oligomer composition which comprises [A] 100 weight parts of a ladder silicone oligomer containing 1 to 10 weight % of hydroxyl groups and 1 to 10 weight % of ethoxy groups, [B] 1 to 200 weight parts of at least one silicon-containing compound selected from (a) silicone oligomers and polymers having a number average molecular weight of 500 to 100,000, which are obtained by reacting a compound of the following formula (I): ##STR1## wherein R.sub.1 is lower alkyl or phenyl, and R.sub.2 is lower alkyl, with a compound of the following formula (II): ##STR2## wherein R.sub.3 is lower alkyl, or phenyl, and R.sub.4 is lower alkyl, the molar ratio of the compound (I) to the compound (II) being from 1/0.3 to 1/9, and (b) ethyl silicates having a silica content of 28.8 to 45 weight % and hydrolysis products thereof, and [C] an organic solvent. The ladder silicone oligomer composition is useful as a coating material and an adhesive.

Ladder silicone oligomer composition

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Yoichi Namba