Anelva Corporation

Yoichi Ino

Tsutomu Tsukada

Isamu Morisako

Katsumi Ukai

Tatsuo Asamaki

Kiyoshi Hoshino

Toshio Adachi

Kazuo Kosuge

A plasma processing apparatus comprises a vacuum vessel, an anode and a cathode arranged in the vacuum vessel, and a discharge producing power source for intermittently producing main discharge between the anode and the cathode to process a substrate arranged in the proximity of the anode and the cathode. The discharge producing power source comprises a magnetic field setting device including magnetic coils arranged closely to the vacuum vessel and having pole pieces and alternate current power sources for the magnetic coils. The plasma processing apparatus is able to remarkably increase processing speeds and considerably reduce the temperature rise and damage therefrom of substrates to be processed. Moreover, the magnetic field setting device is arranged in a small size to make the plasma processing apparatus compact and small-sized.

Plasma processing apparatus

In a mass spectrometer, a quadrupole electrode comprises four electrodes arranged at a predetermined interval about a device axis along which the mass spectrometer successively comprises an ionized gas source, the quadrupole electrode, and a detector for detecting the gas particles separated in reference to mass-to-charge ratio. At least one of the electrodes comprises a plurality of electrode elements which are divided along the device axis. Each of the electrode elements has a longitudinal axis. The electrode elements are mechanically connected by a mechanically connecting member so that the longitudinal axis are coincident with one another and parallel to the device axis. The electrode elements are electrically connected by an electrically connecting member.

Mass spectrometer of a quadrupole electrode type comprising a divided

In an apparatus for counting ions, a double-collector electron multiplier comprises a first and a second collector for receiving secondary electrons from an exit end of a dynode member of the electron multiplier. The first and the second collectors have a first and a second electron receiving surface, respectively, wherein the second electron receiving surface has a narrower area than the first electron receiving surface. A first and a second amplifier are separately used in amplifying a first and a second electric current produced from the first and the second collectors, respectively. An ammeter is connected through a switch selectively to the first and the second amplifiers to provide a selected measuring range for the number of ions which enter the electron multiplier.

Apparatus comprising a double-collector electron multiplier for counting

A vacuum gauge includes a quadrupole mass spectrometer for measuring an ion current value of respective gas components, the Bayard-Alpart type ionization gauge for measuring an apparent total pressure value of the gas components, an arithmetic logic unit for calculating a predetermined equation so as to obtain concentration of the respective gas components and also measurement sensitivity of the respective gas components, whereby the apparent total pressure value is corrected, based upon the measurement sensitivity of the respective gas components, to derive a real total pressure value of the measured gas components.

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Fuchu, Japan

Yoichi Ino