Ivoclar Vivadent Ag

Technische Universitāt Wien

Yohann Catel

Norbert Moszner

Iris Lamparth

Robert Liska

Urs Karl Fischer

Thorsten Bock

Jörg Angermann

Christian Gorsche

Sven Tauscher

Gernot Peer

Volker Rheinberger

Kai Rist

Brigitte Isabell Voit

Harald Stüger

Michael Haas

Doris Pospiech

Pascal Fässler

Cederic Dellsperger

Sandra Starke

Judith Radebner

Norbert Mozner

Radically polymerizable dental material, which contains at least one ABA or AB block copolymer, preferably at least one monofunctional, radically polymerizable monomer (a) and preferably at least one radically polymerizable urethane di(meth)acrylate telechel (b).

Transparent, fracture-tough polymerization resins for the production of dental shaped bodies

Dental material which comprises at least one compound of formula I, in which Ris a linear, branched or cyclic aliphatic C-Chydrocarbon radical or an aromatic C-Chydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more urethane groups, ester groups, oxygen atoms and/or sulfur atoms; X, Y, Z independently of each other in each case are &#x2014;COOR, &#x2014;CON(RR)&#x2014;, an aromatic C-Chydrocarbon radical or CN, wherein R, R, Rin each case independently of each other is hydrogen, a linear, branched or cyclic aliphatic C-Chydrocarbon radical or an aromatic C-Chydrocarbon radical, wherein the aliphatic or aromatic hydrocarbon radical can be substituted or unsubstituted and wherein aliphatic hydrocarbon radicals can be interrupted by one or more oxygen atoms, and m is 2 or 3.

Dental materials based on cyclopolymerizable crosslinkers

Radically polymerizable dental material which contains at least one compound of Formulae I to III:  The material preferably additionally contains a radically polymerizable monomer, an initiator for the radical polymerization and filler. It is characterized in particular by a low polymerization contraction stress.

Composite with reduced polymerization shrinkage stress

Compounds according to general formula (I) in which M is Ge or Sn, RAr is R, R, R, R, R, independently of one another in each case, are &#x2014;H, &#x2014;F, &#x2014;Cl, &#x2014;OR, &#x2014;SR, &#x2014;N(R), &#x2014;CF, &#x2014;CN, &#x2014;NO, &#x2014;COOR, &#x2014;CONHR, a branched, cyclic or preferably linear Calkyl, Calkenyl, Calkyloxy or a Calkenoxy radical, which can be interrupted one or more times by O, S or &#x2014;NR&#x2014; and substituted by one or more polymerizable groups and/or radicals R, Ris H, a branched, cyclic or preferably linear Calkyl or Calkenyl radical, Ris a chemical bond, an n-valent aromatic radical or a branched, cyclic or preferably linear Calkylene radical, which can be interrupted one or more times by O, S or &#x2014;NR&#x2014; and substituted by one or more polymerizable groups, &#x2550;O and/or radicals R, n is 2 or 3 and m is 0 or 1. The compounds are particularly suitable as photoinitiators for radical polymerization and in particular for the production of dental materials.

Long-wave absorbing photoinitiators

Radically polymerizable composition which contains at least one vinyl ether according to general formula I: 

Polymer materials with unsaturated transfer reagents

Vinylcyclopropane of general formulae I in which X, Y in each case are O or NH, wherein X and Y cannot have the same meaning, Ris a linear or branched C-C-alkyl radical, which can be interrupted by O, S, an ester group or a urethane group, Ris a linear or branched C-C-alkylene radical, which can be interrupted by O, S, an ester group or a urethane group, Ris a hydrocarbon radical with 1 to 20 carbon atoms, which additionally can contain one or more N, O or S atoms, and n is 1, 2, 3 or 4, preferably 1 or 2. The vinylcyclopropanes are characterized by a low shrinkage and a high reactivity on radical polymerization and are suitable in particular for the preparation of dental materials.

Dental materials based on urethane-group-containing vinylcyclopropane derivatives

Radically polymerizable silane according to the general formula I in which Ris a linear or branched aliphatic C-C-alkyl radical, phenyl or alkylated phenyl radical, R, Rindependently of each other in each case are absent or are a linear or branched aliphatic C-C-alkylene radical, which can be interrupted by S or O atoms, R, R, Rindependently of each other in each case are &#x2014;Cl, &#x2014;O&#x2014;CH, &#x2014;O&#x2014;CH, &#x2014;CHor &#x2014;CH, X is CHor O, Y is absent, or is O or NR', wherein R&#x2032; is H or a C-alkyl radical, and Z is absent, or is O, NR&#x2033;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;CO&#x2014;NR&#x2033;&#x2014;, &#x2014;O&#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;NR&#x2033;&#x2014;, or &#x2014;NR&#x2033;&#x2014;CO&#x2014;NR&#x2033;&#x2014;, wherein R&#x2033; is H or a C-alkyl radical and wherein the radicals Rand Rcannot be absent at the same time and Z is absent if Ror Ris absent, polycondensates based thereon and fillers surface-modified therewith.

Polymer materials with silane-based transfer reagents

Dental material which contains at least one vinylcyclopropane of the general formulae I, in which A, B independently of each other are in each case OH or COOH; X, Y independently of each other are in each case O or NH; R, Rindependently of each other are in each case H or an aliphatic linear or branched C-Chydrocarbon radical which can be interrupted by O, S or an ester group; and n, m independently of each other are in each case 0, 1 or 2, wherein, if X&#x2550;Y&#x2550;O, R&#x2260;H and R&#x2260;H, n+m&#x2265;1. The vinylcyclopropanes are characterized by a low shrinkage and a high reactivity on radical polymerization and are suitable in particular for the preparation of dental materials.

Dental materials based on monofunctional vinylcyclopropane derivatives

Acidic monomer according to Formula I: in which A is a linear or branched aliphatic C-C-hydrocarbon group, which can be interrupted by one or more &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;NH&#x2014;, &#x2014;HN&#x2014;CO&#x2014;NH&#x2014; or &#x2014;CO&#x2014;NR&#x2014;; Ris H or a C-Calkyl group; X is absent or is a linear or branched aliphatic C-Chydrocarbon group, which can be interrupted by one or more &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014;O&#x2014;, &#x2014;O&#x2014;CO&#x2014;NH&#x2014;, &#x2014;HN&#x2014;CO&#x2014;NH&#x2014; or &#x2014;CO&#x2014;NR&#x2014;; Ris H or a C-Calkyl group; PG is a radically polymerizable group, preferably vinyl, allyl, CH&#x2550;CR&#x2014;CO&#x2014;Y&#x2014; or RO&#x2014;CO&#x2014;C(&#x2550;CH)&#x2014;CH&#x2014;Y&#x2014;; Y&#x2550;O or NRor is absent; Ris H or CH; Ris H or a C-Calkyl group; Ris H or a C-Calkyl group; n is 1, 2, 3 or 4; m=1 or 2; p=1, 2 or 3; and q=1, 2 or 3. The monomers are particularly suitable as components of dental material.

Acidic hybrid monomers and dental materials based thereon

Dental material which contains a urea derivative according to general formula I, in which Rand Rare in each case independently of each other an aliphatic C-Cradical which can be interrupted by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014;O&#x2014;; X is a radically polymerizable group; Y is a radically polymerizable group or an acid group; n, m are in each case independently of each other 1, 2, or 3.

Dental materials on the basis of urea group-containing monomers

Radically polymerizable dental material which contains at least one radically polymerizable oligomer or polymer with strongly acidic groups, which has a number-average molecular weight of 1,000 to 200,000 g/mol.

Adhesive dental materials with strongly acidic adhesive polymers

&#x3b2;-Ketophosphonic acid according to general formula I: in which A=an aliphatic C-Cradical which can be interrupted by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014;O&#x2014; or &#x2014;O&#x2014;CO&#x2014;C&#x2014;; n=1, 2, 3 or 4; m=1 or 2; X=absent or a C-Cradical which can be interrupted by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014;C&#x2014;, &#x2014;O&#x2014;CO&#x2014;NH&#x2014; or &#x2014;CO&#x2014;NR&#x2014;, wherein Ris H or C-C-alkyl; and PG=a group which can undergo free radical polymerization. The &#x3b2;-ketophosphonic acids are suitable in particular for the preparation of dental materials.

&#x3b2;-Ketophosphonic acids and dental materials based thereon

The invention relates to a dental material which comprises a polymerizable bisphosphonic acid of Formula I:  The invention also relates to the use of a polymerizable bisphosphonic acid of Formula I for the preparation of a dental material and in particular for the preparation of an adhesive, cement or composite.

Growing community of inventors

Rans, Switzerland

Yohann Catel