Hoya Corporation

Yoh-Ichi Yamaguchi

Masato Kobayashi

Kazuhide Yamashiro

Minoru Sugawara

In a method of manufacturing an X-ray mask comprising a substrate, an X-ray transmission layer on the substrate, an X-ray absorption layer on the X-ray transmission layer, the X-ray transmission layer is flattened to remove undulation and to make roughness of the X-ray transmission layer smaller than 100 angstroms. The X-ray transmission layer may be formed by silicon carbide or silicon nitride. Alternatively, the X-ray transmission layer may have a multilayer structure of sandwiched structure comprising either a silicon carbide film or a silicon nitride film.

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Tokyo, Japan

Yoh-Ichi Yamaguchi