Asml Netherlands B.v.

Asme Netherlands B.v.

Yogesh Pramod Karade

Raymond Wilhelmus Louis Lafarre

Nina Vladimirovna Dziomkina

Nicolaas Ten Kate

Elisabeth Corinne Rodenburg

Sjoerd Nicolaas Lambertus Donders

Peter Van Delft

Siegfried Alexander Tromp

Jacobus Josephus Leijssen

Hendrik Huisman

Maurice Wilhelmus Leonardus Hendricus Feijts

Ronald Van Der Wilk

Antonius Johannes Maria Nellissen

Johannes Wilhelmus Damen

Satish Achanta

Jan Bex

Wilhelmus Jacobus Johannes Welters

Eugene Maria Brinkhof

Matteo Filippi

Hendrikus Christoffel Maria Van Doremalen

Raymond Lafarre

Sjoerd Donders

Wilhelmus Welters

Antonius Nellissen

Maurice Feijts

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object are formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Substrate holder and method of manufacturing a substrate holder

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body; a plurality of first burls provided on a first side of the main body and having end surfaces to support a substrate, wherein the first burls each include CrN; and a plurality of second burls provided on a second side of the main body.

An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burs to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 &#x3bc;m. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

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Eindhoven, Netherlands

Yogesh Pramod Karade