Applied Materials Israel Limited

Nova Measuring Instruments Ltd.

Pxe Computational Imaging Ltd.

Nova Corporation

Pxe Computational Imagimg Ltd

Yoav Berlatzky

Yanir Hainick

Dror Shafir

Amir Shoham

Danny Grossman

Gilad Barak

Haim Feldman

Ido Kofler

Doron Meshulach

Ido Dolev

Haim Eder

Michael Rudman

Hagay Famini

Valery Deich

Seffi Sadeh

Kobi Barkan

A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

Optical phase measurement method and system

There are provided systems and methods for digital optical aberration correction and spectral imaging. An optical system may comprise an optical imaging unit, to form an optical image near an image plane of the optical system; a wavefront imaging sensor unit located near the image plane, to provide raw digital data on an optical field and image output near the image plane; and a control unit for processing the raw digital data and the image output to provide deblurred image output, wherein the control unit comprises a storage unit that stores instructions and a processing unit to execute the instructions to receive the image input and the raw digital data of the optical field impinging on the wavefront imaging sensor and generate a deblurred image based on an analysis of the optical mutual coherence function at the imaging plane.

System and method for digital optical aberration correction and spectral imaging

There are provided systems and methods for imaging, measuring an object, and characterizing a sample. An optical, speckle-based imaging system may comprise an illumination unit comprising at least one coherent light source to illuminate a sample; a collection unit for collecting input light from the sample, the collection unit consisting of an imaging optics and a wavefront imaging sensor; and a control unit coupled to the illumination unit and the collection unit for analyzing the input light and generating a speckle wavefront image, wherein the at least one coherent light source is to generate primary speckles in the sample or thereon, and the imaging optics is to capture a secondary speckle pattern induced by the illumination unit in the sample or thereon.

System and method for optical imaging and measurement of objects

A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.

System and method for defect detection using multi-spot scanning

An optical detection system for detecting data on the optical mutual coherence function of input field. The system comprising an encoder having similar unit cells, and an array of sensor cells located at a distance downstream of said unit cells with respect to a general direction of propagation of input light. The array defines a plurality of sub-array unit cells, each sub-array corresponding to a unit cell of the encoder, and each sub-array comprising a predetermined number M of sensor elements. The encoder applies predetermined modulation to input light collected by the system, such that each unit cell of said encoder directs a portion of the collected input light incident thereon onto sub-array unit cell corresponding therewith and one or more neighboring sub-array unit cells within a predetermined proximity region. The number M is determined in accordance with a predetermined number of sub-arrays unit cells within the proximity region.

Wavefront sensor and method of using it

A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected reference and sample paths into the collection channel to thereby create a spectral interference pattern on a detection plane.

Optical system and method for measurements of samples

A system that may include a radiation source to generate a beam of coherent radiation; traveling lens optics to focus the beam so as to generate multiple spots on a surface of a sample and to scan the spots together over the surface; collection optics to collect the radiation scattered from the multiple spots and to focus the collected radiation so as to generate a pattern of interference fringes; and a detection unit to detect changes in the pattern of interference fringes.

A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

A spatial beam shaper structure and a corresponding optical system are provided. The spatial beam shaper structure comprises a light collecting surface configured for affecting light impinging thereon to provide a substantially smooth light profile of at least one optical property, the light collecting surface having a pattern in the form of multiple surface regions comprising regions of at least two different optical properties arranged in an alternating fashion, wherein an interface region between each two locally adjacent regions of the different optical properties has the at least two different optical properties, to provide substantially smooth transition of said different optical properties within the interface region.

Optical element for spatial beam shaping

A method and an apparatus that may include optics that is arranged to illuminate a surface of a sample with radiation and to collect reflected radiation from the surface of the sample; wherein the optics includes a pupil that has multiple pupil segments that correspond to different angular regions of collection or illumination; and a detection module arranged to receive the reflected radiation and generate, for each pupil segment, pupil segment detection signals.

Inspection having a segmented pupil

An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths.

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Kibbutz Beit Guvrin, Israel

Yoav Berlatzky