Samsung Electronics Co., Ltd.

Yo-han Ahn

Jung-sung Hwang

Sang-kap Kim

Chang-jip Yang

Kun-hyung Lee

Joung-sun Lee

Jae-Jun Ryu

Jae-Heung Choi

Ho-wang Kim

Jae-heung Choi

Jin-chul Yoon

Tac-ho Kim

Dong-joo Lee

A wafer exposure apparatus includes a special wafer cooling unit, namely, an air showerhead, for controlling the temperature of a wafer which is to be transferred from a wafer pre-alignment system to a wafer stage of photolithography exposure equipment. The wafer which has been heated in the course of being transferred from a spin coater to the wafer pre-alignment system, and may be further heated by sensors of the wafer pre-alignment system, is cooled to the same temperature as that of a wafer stage. Accordingly, a thermal equilibrium may be rapidly established between the wafer and the wafer stage when the wafer is transferred to the wafer stage. Accordingly, excessive thermal expansion of the wafer caused by a difference in temperature between the wafer and the wafer stage is prevented. Therefore, an excessive error in aligning the wafer with the optics of the photolithography exposure equipment can be prevented.

Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same

A monitoring device and a driving control system for a fan filter unit in a semiconductor clean room for monitoring the operating state of the fan filter unit. The monitoring device includes a switching section in each fan filter unit which alternately applies electrical power to one of a plurality of terminals. The switching section is responsive to a force from an air stream introduced therein via rotation of a fan in the fan filter unit. A display section in each fan filter unit is connected to the plurality of terminals which provide different signals, indicative of an on or off state of the fan, according to which of the plurality of terminals is electrically connected to the electrical power.

Driving control system and monitoring device for fan filter unit in

A fan drive checking system, for an air conditioning system in a clean room having a fan filter unit (FFU), includes a flow sensor for sensing air flow inside a housing of a FFU. The sensor provides a sensor signal indicative of normal and adverse flow conditions in the housing. A control portion in data communication with the sensor outputs a control signal responsive to the sensing signal. An alarm in data communication with the control portion provides a warning when the control signal indicates the adverse flow condition.

Drive checking system for fan filter units in clean room

An air current guiding apparatus includes a plurality of dampers installed on a filter unit on an inner wall of air supply unit for blowing clean air over wafers loaded in a boat for transfer to a reaction chamber for chemical vapor deposition. Each of the dampers has a certain length and angular orientation to force the air in a designated direction so that the air current in a wafer loading chamber maintains an appropriate velocity and is free from air turbulence, thereby minimizing the number of contaminating particles in the wafer loading chamber.

Apparatus for guiding air current in a wafer loading chamber for

A particle counter for counting a number of particles in an air sample includes a sampling probe connected to a counter body with an intake section of the sampling probe having an adjustable area. The intake section is constructed of a plurality of telescopically interconnected shaped pieces that slide within one another to permit lengthening and shortening. The degree of lengthening or shortening determines the adjustable area of the sampling probe, which corresponds to an air speed of the air sample to provide precise particle measurements.

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Seoul, South Korea

Yo-han Ahn