Growing community of inventors

Uiwang-si, South Korea

Yo-Choul Park

Average Co-Inventor Count = 10.50

ph-index = 1

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 3

Yo-Choul ParkYong-Woon Yoon (3 patents)Yo-Choul ParkYou-Jung Park (3 patents)Yo-Choul ParkHea-Jung Kim (3 patents)Yo-Choul ParkYoung-Min Kim (2 patents)Yo-Choul ParkHyun-Ji Song (2 patents)Yo-Choul ParkYun-Jun Kim (2 patents)Yo-Choul ParkChung-Heon Lee (2 patents)Yo-Choul ParkYoo-Jeong Choi (2 patents)Yo-Choul ParkJoon-Young Moon (2 patents)Yo-Choul ParkSeung-Hee Hong (2 patents)Yo-Choul ParkGo-Un Kim (2 patents)Yo-Choul ParkYu-Shin Park (2 patents)Yo-Choul ParkSeung-Wook Shin (2 patents)Yo-Choul ParkChul-Ho Lee (1 patent)Yo-Choul ParkSung-Jae Lee (1 patent)Yo-Choul ParkYoun-Jin Cho (1 patent)Yo-Choul ParkYo-Choul Park (3 patents)Yong-Woon YoonYong-Woon Yoon (12 patents)You-Jung ParkYou-Jung Park (10 patents)Hea-Jung KimHea-Jung Kim (10 patents)Young-Min KimYoung-Min Kim (106 patents)Hyun-Ji SongHyun-Ji Song (20 patents)Yun-Jun KimYun-Jun Kim (15 patents)Chung-Heon LeeChung-Heon Lee (14 patents)Yoo-Jeong ChoiYoo-Jeong Choi (14 patents)Joon-Young MoonJoon-Young Moon (10 patents)Seung-Hee HongSeung-Hee Hong (9 patents)Go-Un KimGo-Un Kim (8 patents)Yu-Shin ParkYu-Shin Park (6 patents)Seung-Wook ShinSeung-Wook Shin (5 patents)Chul-Ho LeeChul-Ho Lee (27 patents)Sung-Jae LeeSung-Jae Lee (19 patents)Youn-Jin ChoYoun-Jin Cho (17 patents)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. Cheil Industries Inc. (3 from 787 patents)


3 patents:

1. 10345706 - Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

2. 9665003 - Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

3. 9513546 - Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition

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as of
12/9/2025
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