Persys Technology Ltd.

Vanek, Yitzhak

Yitzhak Vanek

Leo Mendelovici

Gideon Drimer

The present invention provides systems and methods for determining the cleanliness of a sample, the method including impinging high pressure fluid pulses on a sample disposed in a chamber to liberate particles therefrom and quantifying a number of the liberated particles to determine the cleanliness of the sample.

Apparatus and method to assess sub-micron particle levels of a sample

Determining cleanliness of a sample by providing a continuous flow of clean air into a chamber through a HEPA filter, taking a reference reading of particle counts while the chamber is empty, introducing the sample into the chamber and taking a first reading of a particle count received from all sides of the sample in the chamber to determine loose particles in a particle size range of 0.1 microns up to 5 microns associated with the sample.

Method and apparatus for determining cleanliness of a sample

A method and apparatus for determining cleanliness of a sample is provided. The method includes taking a first reading of particles count of a sample placed into a chamber. The method further includes directing a stream of air over the sample, and taking a second reading of particles count of the sample. The method further includes calculating a difference between the first reading and the second reading, and determining a cleanliness of the sample based upon the difference. The method further includes option of taking an additional reading while a stream of ionized air is directed towards the sample. The method further includes trapping the impurities particles released from the sample by applying a vacuum through the filter, and analyzing the trapped particles to determine nature and chemical composition of the impurities particles.

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Los Gatos, CA, United States of America

Yitzhak Vanek