Hefei Xinsheng Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Beijing Boe Technology Development Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Yinhu Huang

Binbin Cao

Chengshao Yang

Tao Ma

Haijiao Qian

Zhixiang Zou

Wenlong Wang

Botao Song

Zhiyuan Lin

Jun Ma

Yunhai Wan

Liang Lin

Jongwon Moon

Peng Hui Jiang

Ning Liu

Kai Wang

Peng Chen

Haipeng Yang

Jilei Gao

Wenming Ren

Xiangyang Xu

Zhanqi Xu

Ling Han

Zhongzheng Yang

Wenjie Shi

Jong Won Moon

Baek Myoung Kee

An array substrate, a manufacturing method thereof, and a display panel are provided. The array substrate comprises a base substrate, a plurality of gate lines and gate electrodes on the base substrate, each gate electrode being corresponding to and separate from a respective gate line, a gate insulating layer over the gate electrode and the gate line, the gate insulating layer having a first via hole and a second via hole, the first via hole exposing the gate electrode, the second via hole exposing the gate line, a conductive connection layer and a polysilicon semiconductor layer on the gate insulating layer, the conductive connection layer filling the first via hole and the second via hole to connect the gate line with the gate electrode.

Array substrate, manufacturing method thereof, display panel

A manufacturing method of an array substrate, an array substrate and a display device are disclosed. The manufacturing method of the array substrate includes: providing a base substrate (); forming a semiconductor layer on the base substrate; depositing an etch stop layer material on the semiconductor layer; subjecting the etch stop layer material to a wet etching process to form an etch stop layer; subjecting the semiconductor layer to a dry etching process to form an active layer, wherein the active layer includes a first region and a second region surrounding the first region, an orthographic projection of the etch stop layer on the base substrate completely coincides with an orthographic projection of the first region of the active layer on the base substrate.

Manufacturing method of array substrate using dry etching processing and wet etching processing, array substrate and display device

The present application discloses a thin film transistor having an active layer including a channel part, a source contact part, and a drain contact part. At least one of the source contact part and the drain contact part has a contacting edge having one or more irregularities along the contacting edge.

Thin film transistor and display apparatus

A transistor and a method for manufacturing the same, a display substrate, and a display apparatus are provided. The transistor may include: a substrate; an active region on the substrate and including a polycrystalline silicon region; an etch stop layer at a side of the polycrystalline silicon region distal to the substrate; and a first heavily doped amorphous silicon region and a second heavily doped amorphous silicon region both at a side of the etch stop layer distal to the substrate; the polycrystalline silicon region having a first side surface corresponding to the first heavily doped amorphous silicon region and a second side surface corresponding to the second heavily doped amorphous silicon region; wherein an orthographic projection of the polycrystalline silicon region on a plane in which a lower surface of the etch stop layer lies does not go beyond the lower surface of the etch stop layer.

Transistor and method for manufacturing the same, display substrate, and display apparatus

The present disclosure provides an array substrate, a display panel comprising the array substrate, and a display device, as well as a manufacturing method of the array substrate. The array substrate comprises a base substrate, a metal layer arranged over the base substrate, a conductive material layer arranged on the metal layer, and a connection hole arranged over the conductive material layer to expose the conductive material layer.

Array substrate and manufacturing method thereof, display panel and display device

The present invention discloses a carrying device, a wet etching apparatus and a usage method thereof. The carrying device comprises a carrying body and a heating unit both disposed under a to-be-processed substrate, the carrying body is used for carrying the to-be-processed substrate such that the to-be-processed substrate is placed inclined; the heating unit is used for heating the to-be-processed substrate, such that temperature of the to-be-processed substrate rises gradually from a top portion to a bottom portion thereof. In the technical solution of the present invention, by disposing the heating unit under the to-be-processed substrate, the temperature of the to-be-processed substrate rises gradually from the top portion to the bottom portion thereof, thus etch rate of the etchant on the bottom portion of the to-be-processed substrate can be increased, and uniformity of etch rate in the inclined wet etching process is improved.

Carrying device, wet etching apparatus and usage method thereof

The embodiments of the present invention provide an OLED array substrate, a method for manufacturing the OLED array substrate, and a touch display device. The OLED array substrate includes a first metal layer pattern, a transparent conductive layer pattern, an insulating layer pattern disposed between the first metal layer pattern and the transparent conductive layer pattern. The first metal layer pattern includes a metal bridge line. The transparent conductive layer pattern includes an anode of an OLED, a plurality of first electrodes extending in a first direction and a plurality of second electrodes extending in a second direction. Each of the first electrodes includes a plurality of first sub-electrodes, and each of the first sub-electrodes is electrically connected to a corresponding metal bridge line.

OLED array substrate, manufacturing method thereof and touch display device

The present application discloses a method of fabricating a display substrate having an organic layer for reducing parasitic capacitance between electrodes in different layers. The method includes forming the organic layer on a base substrate; subjecting the organic layer to a surface treatment process to descum organic residues from a surface of the organic layer; and forming a passivation layer on a side of the organic layer distal to the base substrate subsequent to subjecting the organic layer to the surface treatment process.

Display substrate having an organic layer and fabricating method thereof

A thin film transistor and manufacturing method thereof, an array substrate and a display device are disclosed. The thin film transistor includes a source electrode, a drain electrode and an active layer; the source electrode, the drain electrode and the active layer are disposed in a same layer, the source electrode and the drain electrode are separately joined to the active layer through their respective side faces, a material of the source electrode and the drain electrode is metal, and a material of the active layer is a metal oxide semiconductor in correspondence with material of the source electrode and the drain electrode. With the thin film transistor, procedures can be decreased, thereby reducing costs.

Thin film transistor with source electrode, drain electrode and active layer prepared in a same layer and method for manufacturing the same, array substrate and display device

A display device and a manufacturing method thereof are provided, and the display device includes a color filter substrate and an array substrate which are cell-assembled, the array substrate includes a first base substrate, an organic insulating layer is formed on the first base substrate, and a via hole is formed in the organic insulating layer; the color filter substrate includes a second base substrate, a main spacer and a secondary spacer is formed on the second base substrate, an orthogonal projection of the secondary spacer is located in an orthogonal projection area of the via hole on the first base substrate, and an orthogonal projection of the main spacer is located outside of the orthogonal projection area of the via hole on the first base substrate.

Display device and manufacturing method thereof

A preparation method of a conductive via hole structure, a preparation method of an array substrate and a preparation method of a display device, the preparation method of the array substrate includes: forming a first metal layer () including the first metal structure (), forming a non-metallic film including a first part corresponding to the first metal structure () and an organic insulating film (') in sequence; patterning the organic insulating film (&#x2032;) to form a first organic insulating layer via hole () corresponding to the first part; then baking to form an organic insulating layer (); and then, removing the first part of the non-metallic film to form a non-metallic layer and expose the part of the surface () of the first metal structure (). This method can avoid the metal structure from being seriously oxidized.

Preparation method of conductive via hole structure, array substrate and display device

A touch control substrate and a display device. The touch control substrate includes a plurality of touch control electrodes for touch controlling, which are made of electric conductive material. The touch control electrodes are disposed in a same layer and intervals are provided between adjacent touch control electrodes. The touch control panel further comprises a vanishing layer, only disposed at the intervals between the adjacent touch control electrodes and edges of each of the touch control electrodes. The vanishing layer is made of transparent insulation material. The touch control substrate and the display device can provide good vanishing effects and have simple manufacturing processes.

Touch control substrate and display device

A capacitive touch panel, a method of determining touch position thereof and a display device are disclosed. The capacitive touch panel comprises a first substrate and a second substrate opposed to each other, the first substrate being provided with a black matrix. The black matrix is formed of a first metal touch electrode layer provided on a side of the first substrate away from the second substrate and a second metal touch electrode layer provided on a side of the first substrate facing the second substrate; and the first metal touch electrode layer comprises a plurality of first touch electrode lines, and the second metal touch electrode layer comprises a plurality of second touch electrode lines intersecting with the first touch electrode lines.

Capacitive touch panel, method of determining touch position and display device

This disclosure provides a transparent conductive thin film, a substrate, a touch screen and a manufacturing method thereof, and a display device. The transparent conductive thin film comprises a first metal oxide layer, a metal layer and a second metal oxide layer arranged in a stacking manner.

Transparent conductive thin film, substrate, touch screen and manufacturing method thereof, and display device

The invention provides a curved display panel, a manufacturing method thereof, and a display device. The manufacturing method of a curved display panel provided by the present invention comprises steps of: preparing a support plate, which comprises a first base and a metal film deposited on one side of the first base, the thermal expansion coefficient of the first base being different from that of the metal film; bonding a display panel with the support plate; heating the support plate, so that the support plate forces the display panel to bend; and separating the support plate from the display panel, thus forming the curved display panel. The manufacturing method of a curved display panel of the present invention is simple in process and not prone to causing damage to the panel.

Growing community of inventors

Beijing, China

Yinhu Huang