Conopco, Inc.

Unilever Plc

Unilever, N.v.

Unilever IP Holdings B.v.

Unilever Global IP Limited

Yingying Pi

Jingjing Liu

Raghupathi Subramanian

Xia Zheng

Shaokun Chang

Jian Liu

Leo Derici

Zhengrong Li

Amit Jayaswal

Congwei Fei

Shao Kun Chang

A hair care composition is disclosed comprising an anti-dandruff agent selected from piroctone olamine, selenium sulfide and mixtures thereof and a copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the copolymer to the amount of the anti-dandruff agent is in the range of from 1:5 to 1:1.

Hair care composition

A hair care composition is disclosed comprising from 0.5 to 45% by weight of a salt of acyl glutamate and an anti-dandruff agent of piroctone olamine, wherein the salt of acyl glutamate and the anti-dandruff agent are present in a weight ratio of from 5:1 to 50:1, and wherein the composition does not comprise other anionic surfactants in addition to the salt of acyl glutamate.

A hair care composition is disclosed comprising a cationically modified guar polymer having a cationic degree of substitution of from 0.35 to 0.70, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CHCHO)SOM, wherein R is an alkyl or alkenyl group having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, 5 ammonium, substituted ammonium or mixtures thereof; n is the degree of ethoxylation of from 0.5 to 3 and from 0.01 to 10% by weight of an anti-dandruff agent selected from azole based anti-fungal agents, piroctone olamine, metal pyrithione salts, selenium sulfide or mixtures thereof; wherein the degree of substitution is measured usingH NMR and the spectrum is recorded at 25&#xb0; C.

A hair care composition is disclosed comprising a copolymer, an ethoxylated alkyl sulfate anionic surfactant having a formula RO(CHCHO)nSOM, wherein R is an alkyl or alkenyl having from 8 to 18 carbon atoms; M is a solubilising cation comprising sodium, potassium, ammonium or mixtures thereof; the degree of ethoxylation n is 2, and from 0.01 to 5% by weight of a zinc-based anti-dandruff agent; wherein the copolymer comprises: a cationic vinyl monomer A represented by the formula: CH&#x2550;C(R)&#x2014;CO&#x2014;NH&#x2014;(CH)NRRRX, wherein Ris a hydrogen atom or a methyl group, each of Rto Ris independently a Calkyl group, preferably a Calkyl group, Xis independently fluoride, chloride, bromide or iodide anion, preferably chloride, and d is an integer of from 1 to 10; a cationic vinyl monomer B represented by the formula: CH&#x2550;C(R)&#x2014;CO(O)&#x2014;(CH)NRRRY, wherein Ris a hydrogen atom or a methyl group, each of Rto Ris independently a Calkyl group, preferably a Calkyl group, Yis independently fluoride, chloride, bromide or iodide anion, preferably chloride, and e is an integer of from 1 to 10; a vinyl monomer C represented by the formula: CH&#x2550;C(R)&#x2014;CO&#x2014;NRR, wherein Ris a hydrogen atom or methyl group, each of Rand Ris independently a hydrogen atom or a Calkyl group, provided that the sum of carbon numbers of Rand Ris from 1 to 4; and wherein the content of monomer A is from 1 to 44 mol % based on the total monomer content of the copolymer, the content of monomer B is from 1 to 44 mol %, and the content of monomer C is from 20 to 75 mol % based on the total monomer content of the copolymer.

This invention relates to a hair care composition which provides the desired anti-dandruff efficacy with uniform deposition of the active materials on hair/scalp. This is achieved through a judicious combination of a specific cationic deposition polymer and selective anti-dandruff agent of the right particle size.

Disclosed is a personal care composition comprising cooling active and copolymer comprising acrylamidopropyltrimonium chloride, wherein the weight ratio of the amount of the cooling active to the amount of the copolymer is in the range from 1:5 to 100:1. The copolymer improves deposition of the cooling active during topical application of the product to skin.

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Shanghai, China

Yingying Pi