Applied Materials, Inc.

Ying Zhang

Jennifer Y Sun

Biraja Prasad Kanungo

Tom K Cho

Vahid Firouzdor

Vedapuram S Achutharaman

A method includes performing ion beam sputtering with ion assisted deposition to deposit a protective layer on a surface of a body. The protective layer is a plasma resistant rare earth-containing film of a thickness less than 1000 μm. The porosity of the protective layer is below 1%. The plasma resistant rare earth-containing film consists of 40 mol % to less than 100 mol % of YO, over 0 mol % to 60 mol % of ZrO, and 0 mol % to 9 mol % of AlO.

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Santa Clara, CA, United States of America

Ying Zhang