The Dow Chemical Company

Dow Global Technolgoies LLC

Ying Hung So

Robert A Devries

Robert L McGee

Edward Otto Shaffer, Ii

Scott Jerome Bis

Steven J Martin

Edmund J Stark

Michael J Radler

Mitchell G Dibbs

Keith Jeffrey Watson

Shellene K Thurston

Daniel Bernardo Roitman

Ritchie A Wessling

Zenon Lysenko

Duane R Romer

Eric S Moyer

Michael E Mills

James P Godschalx

Chieh-Chun Chau

Paul H Townsend, Iii

Thomas D Gregory

Steven Rosenberg

Gary R Buske

Willie E Rochefort

Yongfu Li

Ashish Sen

Jack E Hetzner

Carl W Hurtig

Harvey D Ledbetter

Daniel M Scheck

Kenneth J Quackenbush

Dennis W Smith, Jr

Thomas A DeVilbiss, Iii

Cheryl L Murlick

Katsuhiko Kato

Richard P DeCaire

Gregory S Becker

Kayla J Gallant (nee Baranck)

Shellene K Thruston

Kayla J Baranek

The invention is a composition comprising a curable arylcyclobutene based oligomer or polymer and a dissolution inhibitor which comprises a compound comprising at least two diazonaphthoquinone (DNQ) moieties each of which is pendant from different phenyl groups.

Aqueous developable benzocyclobutene-based polymer composition and method of use of such compositions

The use of hindered phenol containing anti-oxidants enable arylcyclobutene-based formulations to be cured in oxygen containing environments such as air without unacceptable degradation in key properties of dielectric constant, water uptake, or transmittance.

Benzocyclobutene based polymer formulations and methods for processing such formulations in oxidative environments

The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.

Acid functional polymers based on benzocyclobutene

The invention is a photoswitchable benzocyclobutene-based polymer that while remaining aqueous developable, avoids the problem of significant moisture uptake. The oligomer or polymer comprises a polymeric backbone, benzocyclobutene reactive groups, and photoswitchable pendant groups. The pendant groups are bonded to the polymeric backbone and are characterized by the presence of a moiety that converts to carboxylic acid upon exposure to activating wavelengths of radiation a carboxylic acid. When the oligomer or polymer is subsequently heated to cause cure of the oligomer or polymer, carbon dioxide is emitted and the group forms a substantially non-polar moiety. The invention is also a method of making such a polymer and a method of forming a patterned film using such a polymer.

Aqueous developable, photosensitive benzocyclobutene-based oligomers and polymers with high moisture resistance

A photodefineable mixture comprising oligomeric divinyltetramethyldisiloxane bisbenzocyclobutene as its major resin component dissolved in mesitylene and at least 2,6-bis(4-azidobenzylidene)-4-ethylcyclohexanone as a photosensitive agent in an amount sufficient to convert the mixture to an organic-insoluble solid upon exposing the mixture to photon radiation is disclosed. These polymer compositions are useful as thin film dielectrics in electronic applications such as multichip modules, integrated circuits and printed circuit boards.

Photodefineable compositions

An oligomer, uncured polymer or cured polymer comprising the reaction product of one or more polyfunctional compounds containing two or more cyclopentadienone groups and at least one polyfunctional compound containing two or more aromatic acetylene groups wherein at least some of the polyfunctional compounds contain three or more reactive groups. Such oligomers and uncured polymers may be cured to form cured polymers which are useful as dielectrics in the microelectronics industry, especially for dielectrics in integrated circuits.

Polyphenylene oligomers and polymers

Described is a method for preparing a polybenzazole filament which comprises extruding a polybenzazole dope filament, drawing the filament across an air gap, coagulating and washing the filament, and drying the filament, characterized in that a solution of a compound selected from the group consisting of ferrocenes, ruthocene, iodide-, cobalt-, and copper-containing compounds, dyes, and mixtures thereof is contacted with a filament subsequent to the washing step and prior to the drying step. This method provides a means to improve the tensile strength retention of damaged polybenzazole filaments following exposure to sunlight.

Polybenzazole fibers having improved tensile strength retention

Described herein is a process for synthesizing polybenzazole polymers comprising: (a) contacting a bis(trihalomethyl) organic compound with a polyphosphoric acid under reaction conditions sufficient to convert at least about 25 mole percent of the trihalomethyl groups present to carboxylic acid or carboxylate groups, forming a reaction mixture thereby; and (b) contacting the reaction mixture with an aromatic compound having two o-amino-basic moieties under reaction conditions sufficient to form a polybenzazole polymer.

Process for the synthesis of polybenzazole polymers

Graft copolymers of polybenzazole and poly(phenylene sulfide) are synthesized by the reaction of terephthalic acid and 4,6-diaminoresorcinol with 2-(polyphenylene sulfide)terephthalic acid. The resulting graft copolymer can be cross-linked by heating to provide a cross-linked product having improved thermal stability, acid resistance, and compressive strength.

Polybenzazole compositions containing pendant poly(aromatic sulfide)

In reactions to form PBZ polymers such as polybenzoxazole, monomers having an aromatic group bonded to a primary amine group and to a hydroxy, thio or amine group ortho to said primary amine group are contacted with monomers having an electron-deficient carbon group. In the present invention the electron deficient carbon group may be an alkali metal carboxylate group or a trihalomethyl group. Useful monomers include, for example, .alpha.,.alpha.,.alpha.,.alpha.',.alpha.',.alpha.'-hexachloroxylene and disodium terephthalate.

Process for synthesis of heterocyclic polymers

Process for synthesis of heterocyclic polymers with trihalomethyl

It is advantageous to prepare oligomers of polybenzazole polymers by reaction of AA-PBZ monomer with an excess of BB-PBZ monomer. The resulting oligomer dopes may be stored at a temperature at which they remain pumpable until such time as the dope can be advanced to higher molecular weight by adding additional AA-PBZ monomer. The molecular weight of the polymer may be adjusted by controlling the amount of chain extender and/or chain terminator added to oligomer mixtures as they are advanced to final molecular weight.

Staged polymerization of polybenzazole polymers

A polymer comprising a backbone portion containing at least one amide moiety and a plurality of imidazole, benzimidazole, benzoxazole, or benzothiazole moieties is prepared by contacting a polyisocyanate with a compound containing at least two end moieties selected from the following: imidazole, benzimidazole, benzoxazole, or benzothiazole, under reaction conditions sufficient to form the corresponding polymer containing amide moieties are disclosed. The process of the invention is suitable for the preparation of thermoset polymers which are advantageously free of surface defects, since a solvent is not required and no volatiles are evolved during the curing process. Urethane and/or urea polymers comprising a backbone portion containing at least one urea or urethane moiety, at least one amide moiety, and a plurality of imidazole, benzimidazole, benzoxazole, or benzothiazole moieties are also disclosed.

Polymers containing amide moieties and a process for their preparation

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Midland, MI, United States of America

Ying Hung So